Structure and morphology of Ru films grown by atomic layer deposition from 1-ethyl-1′-methyl-ruthenocene

Journal of Crystal Growth

Volumn 312, Issue 12-13, 2010, Pages 2025-2032

  Kukli, Kaupo ^a,b   Aarik, Jaan ^a   Aidla, Aleks ^a   Uustare, Teet ^a   Jgi, Indrek ^a   Lu, Jun ^c   Tallarida, Massimo ^d   Kemell, Marianna ^b   Kiisler, Alma Asta ^a   Ritala, Mikko ^b   Leskel, Markku ^b  

^a UNIVERSITY OF TARTU   (Estonia)

^b UNIVERSITY OF HELSINKI   (Finland)

^c UPPSALA UNIVERSITY   (Sweden)

^d BRANDENBURG UNIVERSITY OF TECHNOLOGY   (Germany)

Author keywords

A1. Crystal morphology; A1. Roughening; A1. Substrates; A3. Atomic layer epitaxy; A3. Chemical vapor deposition processes; A3. Polycrystalline deposition

Indexed keywords

A1. CRYSTAL MORPHOLOGY; A1. ROUGHENING; CHEMICAL VAPOR DEPOSITION PROCESS; CRYSTAL MORPHOLOGIES; POLY CRYSTALLINE DEPOSITION;

ATOMIC LAYER DEPOSITION; ATOMS; CHEMICAL VAPOR DEPOSITION; CRYSTAL ATOMIC STRUCTURE; CRYSTAL GROWTH; DEPOSITION; EPITAXIAL FILMS; HAFNIUM COMPOUNDS; METALLIC COMPOUNDS; MORPHOLOGY; OXIDE MINERALS; OXYGEN; RUTHENIUM; RUTHENIUM COMPOUNDS; SILICON COMPOUNDS; SILICON OXIDES; THICK FILMS;

OXIDE FILMS;

EID: 77955232208     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2010.03.033     Document Type: Article

References (45)

1. H.-C. Wen, P. Mahji, K. Choi, C.S. Park, H.N. Alshareef, H.R. Harris, H. Luan, H. Niimi, H.-B. Park, G. Bersuker, P.S. Lysaght, D.-L. Kwong, S.C. Song, B.H. Lee, and R. Jammy Microelectron. Eng. 85 2008 2
2. T.-K. Eom, W. Sari, K.-J. Choi, W.-C. Shin, J.H. Kim, D.-J. Lee, K.-B. Kim, H. Sohn, and S.-H. Kim Electrochem. Solid-State Lett. 12 2009 D85
3. S.Y. Kang, C.S. Hwang, and H.J. Kim J. Electrochem. Soc. 152 2005 C15
4. M. Hasan, H. Park, J.-M. Lee, M. Jo, and H. Hwang Microelectron. Eng. 84 2007 2205
5. K. Frhlich, J. Aarik, M. Ťapajna, A. Rosov, A. Aidla, E. Dobroka, and K. Huekov J. Vac. Sci. Technol. B 27 2009 266
6. K. Frhlich, M. Ťapajna, A. Rosov, E. Dobroka, K. Huekov, J. Aarik, and A. Aidla Electrochem. Solid-State Lett. 11 2008 G19
7. S.K. Kim, G.-J. Choi, S.Y. Lee, M. Seo, S.W. Lee, J.H. Han, H.-S. Ahn, S. Han, and C.S. Hwang Adv. Mater. 20 2007 1
8. L. Pantisano, T. Schram, Z. Li, J.G. Lisoni, G. Pourtois, S. De Gendt, D.P. Brunco, A. Akheyar, V.V. Afanas'ev, S. Shamuilia, and A. Stesmans Appl. Phys. Lett. 88 2006 243514
9. X. Zhao, J. Hrbek, and J.A. Rodriguez Surf. Sci. 575 2005 115
10. K.M. Kim, S.Y. Lee, G.J. Choi, J.H. Han, and C.S. Hwang Electrochem. Solid-State Lett. 13 2010 G1
11. H.J. Cho, Y.D. Kim, D.S. Park, E. Lee, C.H. Park, J.S. Jang, K.B. Lee, H.W. Kim, Y.J. Ki, I.K. Han, and Y.W. Song Solid-State Electron. 51 2007 1529
12. S.W. Lee, O.S. Kwon, and C.S. Hwang Microelectron. Eng. 80 2005 158
13. S.W. Lee, O.S. Kwon, J.H. Han, and C.S. Hwang Appl. Phys. Lett. 92 2008 222903
14. T. Kikkawa, N. Fujiwara, H. Yamada, S. Miyazaki, F. Nishiyama, and M. Hirose Appl. Phys. Lett. 81 2002 2821
15. C. Zhao, M. Pawlak, M.I. Popovici, M. Shaekers, E. Sleekckx, E. Vancoille, D. Vouters, Z. Tokei, and J. Kittl ECS Trans. 25 2009 377
16. K.H. Kuesters, M.F. Beug, U. Schroeder, N. Nagel, U. Bewersdorff, G. Dallmann, S. Jakschik, R. Knoefler, S. Kudelka, C. Ludwig, D. Manger, W. Mueller, and A. Tilke Adv. Eng. Mater. 11 2009 241
17. S. Rangan, E. Bersch, R.A. Bartynski, E. Garfunkel, and E. Vescovo Phys. Rev. B 79 2009 075106
18. S.-J. Park, W.-H. Kim, W.J. Maeng, Y.S. Yang, C.G. Park, H. Kim, K.-N. Lee, S.-W. Jung, and W.K. Seong Thin Solid Films 516 2008 7345
19. S.-J. Park, W.-H. Kim, H.-B.-R. Lee, W.J. Maeng, and H. Kim Microelectron. Eng. 85 2008 39
20. T. Aaltonen, M. Ritala, Y.-L. Tung, Y. Chi, K. Arstila, K. Meinander, and M. Leskel J. Mater. Res. 19 2004 3353
21. T. Aaltonen, M. Ritala, K. Arstila, J. Keinonen, and M. Leskel Chem. Vap. Deposition 10 2004 215
22. K.-W. Do, J.-S. Roh, K.-J. Lee, D.-S. Kil, Y.-D. Kim, J.-H. Kim, K.-W. Park, US Patent Appl. US20090061587 (filed June 27, 2008).
23. V.Y. Vasilyev, K.P. Mogilnikov, and Y.W. Song Curr. Appl. Phys. 9 2009 e148
24. K. Kawano, A. Nagai, H. Kosuge, T. Shibutami, N. Oshima, and H. Funakubo Electrochem. Solid-State Lett. 9 2006 C107
25. K. Kawano, H. Kosuge, N. Oshima, and H. Funakubo Electrochem. Solid-State Lett. 10 2007 D60
26. C.F. Karanikas, and J.J. Watkins Microelectron. Eng. 87 2010 566
27. J. Musschoot, Q. Xie, D. Deduytsche, K. De Keyser, D. Longrie, J. Haemers, S. Van den Berghe, R.L. Van Meirhaeghe, J. D'Haen, C. Detavernier, Microelectron. Eng. (2009) 10.1016/j.mee.2009.11.020.
28. K. Kukli, M. Ritala, M. Kemell, and M. Leskel J. Electrochem. Soc. 157 2010 D35
29. S.K. Kim, S.Y. Lee, S.W. Lee, G.W. Hwang, C.S. Hwang, J.W. Lee, and J. Jeong J. Electrochem. Soc. 154 2007 D95
30. C.A. Hoover, D.M. Thompson, J.E. Geary, J.P. Natwora Jr., M.M. Litwin, and J. Peck Electrochem. Soc. Proc. 2005-05 2005 389
31. S. Meiere, J. Geary, D. Thompson, B. Souter, M. Litwin, J. Peck, Atomic Layer Deposition, Bruges, July 2, 2008. Presentation available on conference DVD.
32. K. Kukli, J. Aarik, A. Aidla, I. Jgi, J. Lu, A.-A. Kiisler, M. Ritala, M. Leskel, S. Meiere, D.M. Thompson, J. Peck, J. Natwora, J. Geary, R. Spohn, submitted for publication.
33. J. Aarik, A. Aidla, T. Uustare, and V. Sammelselg J. Cryst. Growth 148 1995 268
34. J. Aarik, A. Aidla, T. Uustare, M. Ritala, and M. Leskel Appl. Surf. Sci. 161 2000 385
35. J. Aarik, A. Aidla, V. Sammelselg, T. Uustare, M. Ritala, and M. Leskel Thin Solid Films 370 2000 163
36. J. Aarik, A. Aidla, H. Mndar, T. Uustare, and V. Sammelselg Thin Solid Films 408 2002 97
37. K. Kukli, J. Aarik, M. Ritala, T. Uustare, T. Sajavaara, J. Lu, J. Sundqvist, A. Aidla, L. Pung, A. Hrsta, and M. Leskel J. Appl. Phys. 96 2004 5298
38. S. Dueas, H. Castn, H. Garca, A. de Castro, L. Bailn, K. Kukli, A. Aidla, J. Aarik, H. Mndar, T. Uustare, J. Lu, and A. Hrsta J. Appl. Phys. 99 2006 054902
39. H. Mndar, T. Uustare, J. Aarik, A. Tarre, and A. Rosental Thin Solid Films 515 2007 4570
40. R.A. Waldo Microbeam Anal. 1988 310 314
41. A. Lewera, W.P. Zhou, C. Vericat, J.H. Chung, R. Haasch, A. Wieckowski, and P.S. Bagus Electrochim. Acta 51 2006 3950
42. C. Mun, J.J. Ehrhardt, J. Lambert, and C. Madic Appl. Surf. Sci. 253 2007 7613
43. B. Luo, Q. Wang, and J.M. White Chem. Vap. Deposition 10 2004 311
44. L. Belau, J.Y. Park, T. Liang, H. Seo, and G.A. Somorjai J. Vac. Sci. Technol. B 27 2009 1919
45. K.M. Thom, and J.G. Ekerdt Thin Solid Films 518 2009 36