Effectiveness of self-carbon and titanium capping layers in NiSi formation with Ni film deposited by atomic layer deposition

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 46, Issue 4 B, 2007, Pages 1981-1983

  Yang, Chung Mo ^a   Yun, Sang Won ^a   Ha, Jong Bong ^a   Na, Kyung Il ^a   Cho, Hyun Ick ^a   Lee, Heon Bok ^a   Jeong, Jong Hwa ^a   Kong, Sung Ho ^a   Hahm, Sung Ho ^a   Lee, Jung Hee ^a  

^a Kyungpook National University   (South Korea)

Author keywords

Atomic layer deposition; Carbon control; Nickel silicide; Self capping layer

Indexed keywords

ATOMIC LAYER DEPOSITION; CARBON; FLOW RATE; OXIDATION; RAPID THERMAL ANNEALING; THIN FILMS;

CARBON CONTROL; NICKEL SILICIDE; RAPID THERMAL PROCESS (RTP); SELF CAPPING LAYERS; SILICIDATION;

NICKEL COMPOUNDS;

EID: 34547875462     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.46.1981     Document Type: Article

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