Atomic layer deposition - Sequential self-limiting surface reactions for advanced catalyst "bottom-up" synthesis

Surface Science Reports

Volumn 71, Issue 2, 2016, Pages 410-472

  Lu, Junling ^a   Elam, Jeffrey W ^b   Stair, Peter C ^b,c  

^a UNIVERSITY OF SCIENCE AND TECHNOLOGY OF CHINA   (China)

^b ARGONNE NATIONAL LABORATORY   (United States)

^c NORTHWESTERN UNIVERSITY   (United States)

Author keywords

Alloy; Atomic layer deposition; Bimetallic catalysts; Catalyst synthesis; Core shell structure; Heterogeneous catalysis; Metal oxide catalyst; Metal particle size; Metal oxide interfaces; Oxide overcoat; Photocatalytic architectures; Single atom catalyst; Supported metal catalyst

Indexed keywords

ALLOYING; ATOMIC LAYER DEPOSITION; ATOMS; BIMETALS; CATALYSIS; CATALYST ACTIVITY; CATALYST SELECTIVITY; CATALYSTS; CHEMICAL VAPOR DEPOSITION; DEPOSITION; DESIGN; DISPERSIONS; METAL NANOPARTICLES; METALLIC COMPOUNDS; METALS; NANOPARTICLES; PARTICLE SIZE; SURFACE CHEMISTRY; SURFACE REACTIONS; SYNTHESIS (CHEMICAL); VAPOR DEPOSITION;

BIMETALLIC CATALYSTS; CATALYST SYNTHESIS; CORE SHELL STRUCTURE; METAL OXIDE CATALYSTS; METAL OXIDE INTERFACE; METAL PARTICLE; PHOTO-CATALYTIC; SINGLE ATOMS; SUPPORTED-METAL CATALYSTS;

CATALYST SUPPORTS;

EID: 84974807309     PISSN: 01675729     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfrep.2016.03.003     Document Type: Review

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