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Thin Solid Films

Volumn 279, Issue 1-2, 1996, Pages 124-130

Monolayer thickness in atomic layer deposition

(1) Ylilammi, Markku a

a VTT TECHNICAL RESEARCH CENTRE OF FINLAND (Finland)

Author keywords

Fluorides; Monolayers; Oxides; Sulphides

Indexed keywords

ADSORPTION; CALCULATIONS; CHEMISORPTION; DEPOSITION; EPITAXIAL GROWTH; FLUORINE COMPOUNDS; OXIDES; SULFUR COMPOUNDS; SURFACE PHENOMENA; THICKNESS MEASUREMENT;

ATOMIC LAYER DEPOSITION; REACTANT MOLECULES; SURFACE CONFIGURATION; SURFACE REACTIONS;

MONOLAYERS;

EID: 0030167492 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/0040-6090(95)08159-3 Document Type: Article

Times cited : (126)

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