Low temperature atomic layer deposition of noble metals using ozone and molecular hydrogen as reactants

Thin Solid Films

Volumn 531, Issue , 2013, Pages 243-250

  Hämäläinen, Jani ^a   Puukilainen, Esa ^a   Sajavaara, Timo ^b   Ritala, Mikko ^a   Leskelä, Markku ^a  

^a UNIVERSITY OF HELSINKI   (Finland)

^b UNIVERSITY OF JYVÄSKYLÄ   (Finland)

Author keywords

Atomic layer deposition; Noble metal; Noble metal oxide; Palladium oxide; Thin films

Indexed keywords

IMPURITY CONTENT; LOW TEMPERATURES; METAL PRECURSOR; METAL THIN FILM; MOLECULAR HYDROGEN; NOBLE METAL OXIDES; PALLADIUM OXIDES; THERMAL PROCESS;

DEPOSITION; MOLECULAR PHYSICS; OZONE; PALLADIUM; PRECIOUS METALS; SURFACE ROUGHNESS; THIN FILMS;

ATOMIC LAYER DEPOSITION;

EID: 84875435281     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2013.01.091     Document Type: Article

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