Atomic layer epitaxy of copper: An ab initio investigation of the CuCl/H2 process. II. Reaction energies

Applied Surface Science

Volumn 148, Issue 1, 1999, Pages 9-16

  Mårtensson, Per ^a   Larsson, Karin ^a   Carlsson, Jan Otto ^a  

^a UPPSALA UNIVERSITY   (Sweden)

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION; COMPUTATIONAL METHODS; COPPER COMPOUNDS; EPITAXIAL GROWTH; HYDROGEN; PHASE INTERFACES; REACTION KINETICS;

ATOMIC LAYER EPITAXY (ALE); COPPER CHLORIDE; DENSITY FUNCTIONAL THEORY (DFT); REACTION ENERGY; SURFACE REACTIONS;

COPPER;

EID: 0343634274     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(99)00141-5     Document Type: Article

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