Rapid SiO2 atomic layer deposition using tris(tert-pentoxy) silanol

Chemistry of Materials

Volumn 20, Issue 22, 2008, Pages 7031-7043

  Burton, B B ^a   Boleslawski, M P ^c   Desombre, A T ^c   George, S M ^a,b  

^a UNIVERSITY OF COLORADO   (United States)

^b UCB 450   (United States)

^c SAFC Hitech   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC LAYER DEPOSITION (ALD; ATOMIC LAYERS; CATALYTIC SITES; DELAY TIMES; EXPOSURE TIMES; HIGHER TEMPERATURES; LEWIS BASE; LINKING REACTIONS; MICROPULSES; POLYMER CHAINS; POLYMERIZATION RATES; PRESSURE DEPENDENCES; PYRIDINE DERIVATIVES; QUARTZ CRYSTALS; SILANOL; SILOXANE POLYMERS; SUBSTRATE TEMPERATURES; TEMPERATURE DEPENDENCES; X-RAY REFLECTIVITIES;

ALUMINUM; ATOMIC PHYSICS; ATOMS; CHEMICAL REACTIONS; CRYSTAL IMPURITIES; FILM GROWTH; GROWTH (MATERIALS); GROWTH KINETICS; HEAT SHIELDING; LIGHT WEIGHT ROLLING STOCK; MAGNETIC FILMS; MONOMERS; NUCLEATION; OXIDE MINERALS; PHOTORESISTS; POLYMERIZATION; POLYMERS; QUARTZ; QUARTZ CRYSTAL MICROBALANCES; RATE CONSTANTS; SILICON COMPOUNDS;

PHYSICAL VAPOR DEPOSITION;

EID: 57549095398     PISSN: 08974756     EISSN: None     Source Type: Journal    
DOI: 10.1021/cm801738z     Document Type: Article

References (38)

1. George, S. M.; Ott, A. W.; Klaus, J. W. J. Phys. Chem. 1996, 100, 13121.
2. Ritala, M.; Leskela, M. Handbook of Thin Film Materials; Academic Press: San Diego, CA, 2001.
3. Wolf, S.; Tauber, R. N. Silicon Processing for the VLSI Era, Process Technology; Lattice Press: Sunset Beach, CA, 1986.
4. Ferguson, J. D.; Weimer, A. W.; George, S. M. Chem. Mater. 2000, 12, 3472.
5. Ferguson, J. D.; Weimer, A. W.; George, S. M. Appl. Surf. Sci. 2000, 162, 280.
6. Klaus, J. W.; Ott, A. W.; Johnson, J. M.; George, S. M. Appl. Phys. Lett. 1997, 70, 1092.
7. Sneh, O.; Wise, M. L.; Ott, A. W.; Okada, L. A.; George, S. M. Surf. Sci. 1995, 334, 135.
8. Du, Y.; Du, X.; George, S. M. Thin Solid Films 2005, 491, 43.
9. Du, Y.; Du, X.; George, S. M. J. Phys. Chem. C 2007, 111, 219.
10. Klaus, J. W.; George, S. M. Surf. Sci. 2000, 447, 81.
11. Klaus, J. W.; Sneh, O.; George, S. M. Science 1997, 278, 1934.
12. Klaus, J. W.; Sneh, O.; Ott, A. W.; George, S. M. Surf. Rev. Lett. 1999, 6, 435.
13. Gasser, W.; Uchida, Y.; Matsumura, M. Thin Solid Films 1994, 250, 213.
14. Morishita, S.; Uchida, Y.; Matsumura, M. Jpn. J. Appl. Phys., Part 1 1995, 34, 5738.
15. Yamaguchi, K.; Imai, S.; Ishitobi, N.; Takemoto, M.; Miki, H.; Matsumura, M. Appl. Surf. Sci. 1998, 132, 202.
16. Lee, J. H.; Kim, U. J.; Han, C. H.; Rha, S. K.; Lee, W. J.; Park, C. O. Jpn. J. Appl. Phys., Part 2 2004, 43, L328.
17. Lim, J. W.; Yun, S. J.; Lee, J. H. ETRI J. 2005, 27, 118.
18. Miller, K. A.; John, C.; Zhang, K. Z.; Nicholson, K. T.; McFeely, F. R.; Holl, M. M. B. Thin Solid Films 2001, 397, 78.
19. Hausmann, D.; Becker, J.; Wang, S. L.; Gordon, R. G. Science 2002, 298, 402.
20. de Rouffignac, P.; Li, Z. W.; Gordon, R. G. Electrochem. Solid-State Lett. 2004, 7, G306.
21. Zhong, L. J.; Daniel, W. L.; Zhang, Z. H.; Campbell, S. A.; Gladfelter, W. L. Chem. Vap. Deposition 2006, 12, 143.
22. Zhong, L. J.; Zhang, Z. H.; Campbell, S. A.; Gladfelter, W. L. J. Mater. Chem. 2004, 14, 3203.
23. He, W.; Solanki, R.; Conley, J. F.; Ono, Y. J. Appl. Phys. 2003, 94, 3657.
24. Elam, J. W.; Groner, M. D.; George, S. M. Rev. Sci. Instrum. 2002, 73, 2981.
25. Fabreguette, F. H.; Sechrist, Z. A.; Elam, J. W.; George, S. M. Thin Solid Films 2005, 488, 103.
26. Ferguson, J. D.; Weimer, A. W.; George, S. M. Thin Solid Films 2000, 371, 95.
27. Ferguson, J. D.; Weimer, A. W.; George, S. M. Thin Solid Films 2002, 413, 16.
28. Ferguson, J. D.; Weimer, A. W.; George, S. M. Chem. Mater. 2004, 16, 5602.
29. Gaul, J. H.; Carr, T. M. Spectrosc. Lett. 1983, 16, 651.
30. Smith, D. L. Thin-Film Deposition: Principles and Practice: McGraw-Hill: New York,1995; Chapter 13.
31. Hausmann, D. M.; Kim, E.; Becker, J.; Gordon, R. G. Chem. Mater. 2002, 14, 4350.
32. Petersen, K. E. IEEE Trans. Electron Devices 1978, 35, 1241.
33. Alexiadis, A.; Andes, C.; Ferrari, D.; Korber, F.; Hauschild, K.; Bochmann, M.; Fink, G. Macromol. Mater. Eng. 2004, 289, 457.
34. Knoke, S.; Korber, F.; Fink, G.; Tesche, B. Macromol. Chem. Phys. 2003, 204, 607.
35. Zechlin, J.; Steinmetz, B.; Tesche, B.; Fink, G. H. Macromol. Chem. Phys. 2000, 201, 515.
36. Kim, S. H.; Vurens, G.; Somorjai, G. A. J. Catal. 2000, 193, 171.
37. Kim, S. H.; Tewell, C. R.; Somorjai, G. A. Korean J. Chem. Eng. 2002, 19, 1.
38. Kim, S. H.; Somorjai, G. A. Catal. Lett. 2000, 68, 7.