Atomic layer epitaxy of copper: An ab initio investigation of the CuCl/H2 process. III. Reaction barriers

Applied Surface Science

Volumn 157, Issue 1, 2000, Pages 92-100

  Mårtensson, Per ^a   Larsson, Karin ^a   Carlsson, Jan Otto ^a  

^a UPPSALA UNIVERSITY   (Sweden)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; ADDITION REACTIONS; ADSORPTION; CHLORINE; COPPER COMPOUNDS; DIFFUSION IN SOLIDS; HYDROGEN; PROBABILITY DENSITY FUNCTION;

ATOMIC LAYER EPITAXY; REACTION BARRIERS;

COPPER;

EID: 0342656545     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(99)00519-X     Document Type: Article

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