Scanning tunneling microscopy studies of oxygen adsorption on Cu(1 1 1)

Surface Science

Volumn 471, Issue 1-3, 2001, Pages 225-245

  Matsumoto, T ^a   Bennett, R A ^b   Stone, P ^b   Yamada, T ^c   Domen, K ^a   Bowker, M ^b  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

^b UNIVERSITY OF READING   (United Kingdom)

^c WASEDA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; COPPER; COPPER OXIDES; CRYSTAL LATTICES; GAS ADSORPTION; INTERDIFFUSION (SOLIDS); LOW ENERGY ELECTRON DIFFRACTION; MORPHOLOGY; OXIDATION; POINT DEFECTS; SCANNING TUNNELING MICROSCOPY; SURFACE PHENOMENA;

VACANCIES;

OXYGEN;

EID: 0035151904     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0039-6028(00)00918-3     Document Type: Article

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