Thickness profiles of thin films caused by secondary reactions in flow-type atomic layer deposition reactors

Journal of Physics D: Applied Physics

Volumn 30, Issue 12, 1997, Pages 1725-1728

  Siimon, H ^a   Aarik, J ^a  

^a UNIVERSITY OF TARTU   (Estonia)

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION; CHEMISORPTION; DEPOSITION; HYDROCHLORIC ACID; MATHEMATICAL MODELS; OXIDES; REACTION KINETICS; WATER;

ATOMIC LAYER DEPOSITION; METAL CHLORIDES; METAL OXIDES;

THIN FILMS;

EID: 0031168979     PISSN: 00223727     EISSN: None     Source Type: Journal    
DOI: 10.1088/0022-3727/30/12/006     Document Type: Article

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