Growth per cycle in atomic layer deposition: A theoretical model

Chemical Vapor Deposition

Volumn 9, Issue 5, 2003, Pages 249-257

  Puurunen, Riikka L ^a,b  

^a AALTO UNIVERSITY   (Finland)

^b IMEC   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

CATALYSTS; CHEMISORPTION; MATHEMATICAL MODELS; MICROELECTRONICS; MONOLAYERS; POROUS MATERIALS; SATURATION (MATERIALS COMPOSITION); THIN FILMS;

ATOMIC LAYER DEPOSITION (ALD); SOLID SUBSTRATES; THIN LAYERS;

CHEMICAL VAPOR DEPOSITION;

EID: 0346291270     PISSN: 09481907     EISSN: None     Source Type: Journal    
DOI: 10.1002/cvde.200306265     Document Type: Article

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