Low-Temperature Atomic Layer Deposition of Crystalline and Photoactive Ultrathin Hematite Films for Solar Water Splitting

ACS Nano

Volumn 9, Issue 12, 2015, Pages 11775-11783

  Steier, Ludmilla ^a   Luo, Jingshan ^a   Schreier, Marcel ^a   Mayer, Matthew T ^a   Sajavaara, Timo ^b   Grätzel, Michael ^a  

^a EPFL   (Switzerland)

^b UNIVERSITY OF JYVÄSKYLÄ   (Finland)

Author keywords

atomic layer deposition; hematite; photoactive thin films; photoelectrochemical water oxidation; underlayer

Indexed keywords

ASPECT RATIO; ATOMIC LAYER DEPOSITION; ATOMS; CONDUCTIVE FILMS; CRYSTALLINE MATERIALS; DEPOSITION; EFFICIENCY; ELECTROCHEMISTRY; ELECTROMAGNETIC WAVE ABSORPTION; HEMATITE; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; LIGHT ABSORPTION; PHOTOCURRENTS; QUANTUM EFFICIENCY; SCAFFOLDS; TEMPERATURE; THIN FILMS; TITANIUM DIOXIDE; TRANSMISSION ELECTRON MICROSCOPY; ULTRATHIN FILMS;

HIGH-TEMPERATURE ANNEALING; INTERNAL QUANTUM EFFICIENCY; LOW- TEMPERATURE PROCESS; NANOSTRUCTURED SUBSTRATES; PHOTOELECTROCHEMICAL ANALYSIS; PHOTOELECTROCHEMICAL WATER OXIDATION; SOLAR WATER SPLITTING; UNDERLAYERS;

SEMICONDUCTOR DOPING;

EID: 84952019608     PISSN: 19360851     EISSN: 1936086X     Source Type: Journal    
DOI: 10.1021/acsnano.5b03694     Document Type: Article

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