Atomic layer deposition of SiO2 at room temperature using NH3-catalyzed sequential surface reactions

Surface Science

Volumn 447, Issue 1, 2000, Pages 81-90

  Klaus, J W ^a   George, S M ^a  

^a UNIVERSITY OF COLORADO   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMMONIA; AMORPHOUS FILMS; CATALYSIS; DEPOSITION; ELLIPSOMETRY; FILM GROWTH; INSULATING MATERIALS; MORPHOLOGY; SURFACE ROUGHNESS; ULTRATHIN FILMS;

ATOMIC LAYER DEPOSITION;

SILICA;

EID: 0033909031     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0039-6028(99)01119-X     Document Type: Article

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