Localized surface plasmon resonance nanosensor: A high-resolution distance-dependence study using atomic layer deposition

Journal of Physical Chemistry B

Volumn 109, Issue 43, 2005, Pages 20522-20528

  Whitney, Alyson V ^a   Elam, Jeffrey W ^b   Zou, Shengli ^a   Zinovev, Alex V ^b   Stair, Peter C ^a   Schatz, George C ^a   Van Duyne, Richard P ^a  

^a NORTHWESTERN UNIVERSITY   (United States)

^b ARGONNE NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC LAYER DEPOSITION; LOCALIZED SURFACE PLASMON RESONANCCE; NANOSENSOR; QUARTZ CRYSTAL MICROBALANCE (QCM);

CRYSTALS; DECOMPOSITION; LITHOGRAPHY; MONOLAYERS; NANOSTRUCTURED MATERIALS; QUARTZ; SURFACE PLASMON RESONANCE; X RAY PHOTOELECTRON SPECTROSCOPY;

SENSORS;

ALUMINUM OXIDE;

ARTICLE; CHEMISTRY; KINETICS; METHODOLOGY; NANOTECHNOLOGY; SCANNING ELECTRON MICROSCOPY; SENSITIVITY AND SPECIFICITY; SURFACE PLASMON RESONANCE;

ALUMINUM OXIDE; KINETICS; MICROSCOPY, ELECTRON, SCANNING; NANOTECHNOLOGY; SENSITIVITY AND SPECIFICITY; SURFACE PLASMON RESONANCE;

EID: 27744588324     PISSN: 15206106     EISSN: None     Source Type: Journal    
DOI: 10.1021/jp0540656     Document Type: Article

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