Atomic layer controlled growth of SiO2 films using binary reaction sequence chemistry

Applied Physics Letters

Volumn 70, Issue 9, 1997, Pages 1092-1094

  Klaus, J W ^a   Ott, A W ^a   Johnson, J M ^a   George, S M ^a  

^a UNIVERSITY OF COLORADO   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000763519     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.118494     Document Type: Article

References (12)

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