Real-time observation of atomic layer deposition inhibition: Metal oxide growth on self-assembled alkanethiols

ACS Applied Materials and Interfaces

Volumn 6, Issue 15, 2014, Pages 11891-11898

  Avila, Jason R ^a   Demarco, Erica J ^a   Emery, Jonathan D ^b   Farha, Omar K ^a,c   Pellin, Michael J ^b   Hupp, Joseph T ^a   Martinson, Alex B F ^b  

^a NORTHWESTERN UNIVERSITY   (United States)

^b ARGONNE NATIONAL LABORATORY   (United States)

^c KING ABDULAZIZ UNIVERSITY   (Saudi Arabia)

Author keywords

alkanethiol; analytical methods; atomic layer deposition; in situ; quartz crystal microbalance; self assembled monolayers

Indexed keywords

ATOMIC LAYER DEPOSITION; DEPOSITION; METALLIC COMPOUNDS; NUCLEATION; ORGANIC POLYMERS; QUARTZ; QUARTZ CRYSTAL MICROBALANCES; SELF ASSEMBLED MONOLAYERS;

ALKANETHIOLS; ANALYTICAL METHOD; GROWTH INHIBITION; METAL OXIDE DEPOSITION; NUCLEATION DENSITIES; OPTIMIZED CONDITIONS; REAL-TIME OBSERVATION; SITU QUARTZ CRYSTAL MICROBALANCE;

LOADING;

EID: 84906254976     PISSN: 19448244     EISSN: 19448252     Source Type: Journal    
DOI: 10.1021/am503008j     Document Type: Article

References (37)

1. George, S. M. Atomic Layer Deposition: An Overview Chem. Rev. 2010, 110, 111-31
2. Puurunen, R. L. Surface Chemistry of Atomic Layer Deposition: A Case Study for the Trimethylaluminum/Water Process J. Appl. Phys. 2005, 97, 121301
3. Kim, H.; Lee, H.-B.-R.; Maeng, W.-J. Applications of Atomic Layer Deposition to Nanofabrication and Emerging Nanodevices Thin Solid Films 2009, 517, 2563-2580
4. Xu, Y.; Musgrave, C. A DFT Study of the Al2O3 Atomic Layer Deposition on SAMs: Effect of SAM Termination Chem. Mater. 2004, 646-653
5. Färm, E.; Kemell, M.; Ritala, M.; Leskelä, M. Self-Assembled Octadecyltrimethoxysilane Monolayers Enabling Selective-Area Atomic Layer Deposition of Iridium Chem. Vap. Deposition 2006, 12, 415-417
6. Park, K. J.; Doub, J. M.; Gougousi, T.; Parsons, G. N. Microcontact Patterning of Ruthenium Gate Electrodes by Selective Area Atomic Layer Deposition Appl. Phys. Lett. 2005, 86, 051903
7. Jiang, X.; Bent, S. F. Area-Selective ALD with Soft Lithographic Methods: Using Self-Assembled Monolayers to Direct Film Deposition J. Phys. Chem. C 2009, 113, 17613-17625
8. Färm, E.; Kemell, M.; Ritala, M.; Leskelä, M. Selective-area Atomic Layer Deposition with Microcontact Printed Self-assembled Octadecyltrichlorosilane Monolayers as Mask Layers Thin Solid Films 2008, 517, 972-975
9. Elam, J.; Zinovev, A.; Pellin, M.; Comstock, D. J.; Hersam, M. Nucleation and Growth of Noble Metals on Oxide Surfaces using Atomic Layer Deposition ECS Trans. 2007, 3, 271-278
10. Lee, H.-B.-R.; Mullings, M. N.; Jiang, X.; Clemens, B. M.; Bent, S. F. Nucleation-Controlled Growth of Nanoparticles by Atomic Layer Deposition Chem. Mater. 2012, 24, 4051-4059
11. Färm, E.; Vehkamäki, M.; Ritala, M.; Leskelä, M. Passivation of Copper Surfaces for Selective-area ALD using a Thiol Self-assembled Monolayer Semicond. Sci. Technol. 2012, 27, 074004
12. Park, M. H.; Jang, Y. J.; Sung-Suh, H. M.; Sung, M. M. Selective Atomic Layer Deposition of Titanium Oxide on Patterned Self-assembled Monolayers Formed by Microcontact Printing Langmuir 2004, 20, 2257-60
13. George, A.; Knez, M.; Hlawacek, G.; Hagedoorn, D.; Verputten, H. H. J.; van Gastel, R.; ten Elshof, J. E. Nanoscale Patterning of Organosilane Molecular Thin Films from the Gas Phase and its Applications: Fabrication of Multifunctional Surfaces and Large Area Molecular Templates for Site-selective Material Deposition Langmuir 2012, 28, 3045-52
14. Dube, A.; Sharma, M.; Ma, P. F.; Ercius, P. A.; Muller, D. A.; Engstrom, J. R. Effects of Interfacial Organic Layers on Nucleation, Growth, and Morphological Evolution in Atomic Layer Thin Film Deposition J. Phys. Chem. C 2007, 111, 11045-11058
15. 2 High-κ Gate Dielectrics. In Appl. Phys. Lett., 2004; Vol. 84, p 4017.
16. Chen, R.; Kim, H.; McIntyre, P. C.; Bent, S. F. Investigation of Self-Assembled Monolayer Resists for Hafnium Dioxide Atomic Layer Deposition Chem. Mater. 2005, 17, 536-544
17. Wind, R. A.; George, S. M. Quartz Crystal Microbalance Studies of Al2O3 Atomic Layer Deposition using trimethylaluminum and water at 125 degrees C J. Phys. Chem. A 2010, 114, 1281-9
18. Seo, E. K.; Lee, J. W.; Sung-Suh, H. M.; Sung, M. M. Atomic Layer Deposition of Titanium Oxide on Self-Assembled-Monolayer-Coated Gold Chem. Mater. 2004, 16, 1878-1883
19. Kobayashi, N. P.; Donley, C. L.; Wang, S.-Y.; Williams, R. S. Atomic Layer Deposition of Aluminum Oxide on Hydrophobic and Hydrophilic Surfaces J. Cryst. Growth 2007, 299, 218-222
20. Preiner, M. J.; Melosh, N. A. Identification and Passivation of Defects in Self-assembled Monolayers Langmuir 2009, 25, 2585-7
21. Lu, J.; Stair, P. C. Nano/Subnanometer Pd Nanoparticles on Oxide Supports Synthesized by AB-type and Low-temperature ABC-type Atomic Layer Deposition: Growth and Morphology Langmuir 2010, 26, 16486-95
22. Riha, S. C.; Libera, J. A.; Elam, J. W.; Martinson, A. B. F. Design and Implementation of an Integral Wall-mounted Quartz Crystal Microbalance for Atomic Layer Deposition Rev. Sci. Instrum. 2012, 83, 094101
23. Love, J. C.; Estroff, L. A.; Kriebel, J. K.; Nuzzo, R. G.; Whitesides, G. M. Self-assembled Monolayers of Thiolates on Metals as a Form of Nanotechnology Chem. Rev. 2005, 105, 1103-69
24. Elam, J. W.; Baker, D. A.; Hryn, A. J.; Martinson, A. B. F.; Pellin, M. J.; Hupp, J. T. Atomic Layer Deposition of Tin Oxide Films using Tetrakis(dimethylamino) Tin J. Vac. Sci. Technol., A 2008, 26, 244
25. 2 Films Prepared by Plasma Enhanced Atomic Layer Deposition J. Electrochem. Soc. 2008, 155, H688
26. Nilsen, O.; Mohn, C. E.; Kjekshus, A.; Fjellvåg, H. Analytical Model for Island Growth in Atomic Layer Deposition using Geometrical Principles J. Appl. Phys. 2007, 102, 024906
27. Biercuk, M. J.; Monsma, D. J.; Marcus, C. M.; Becker, J. S.; Gordon, R. G. Low-temperature Atomic-Layer-Deposition lift-off Method for Microelectronic and Nanoelectronic Applications Appl. Phys. Lett. 2003, 83, 2405
28. 2 solar cells J. Phys. Chem. B 2000, 104, 8989-8994
29. 2 Low Temperature Epitaxy of Rutile and Anatase J. Electrochem. Soc. 2000, 147, 3319-3325
30. King, D. Oxidation of Gold by Ultraviolet Light and Ozone at 25 C J. Vac. Sci. Technol., A 1995, 13, 1247-1253
31. Vericat, C.; Vela, M. E.; Benitez, G.; Carro, P.; Salvarezza, R. C. Self-assembled Monolayers of Thiols and Dithiols on Gold: New Challenges for a Well-known System Chem. Soc. Rev. 2010, 39, 1805-34
32. Aarik, J.; Aidla, A.; Mändar, H.; Sammelselg, V. Anomalous Effect of Temperature on Atomic Layer Deposition of Titanium Dioxide J. Cryst. Growth 2000, 220, 531-537
33. 3 Alloy Films using Atomic Layer Deposition Techniques Chem. Mater. 2003, 1020-1028
34. Yousfi, E.; Fouache, J.; Lincot, D. Study of Atomic Layer Epitaxy of Zinc Oxide by in-situ Quartz Crystal Microgravimetry Appl. Surf. Sci. 2000, 153, 223-234
35. Herrmann, C. F.; DelRio, F. W.; Bright, V. M.; George, S. M. Conformal Hydrophobic Coatings Prepared using Atomic Layer Deposition Seed Layers and Non-chlorinated Hydrophobic Precursors J. Micromech. Microeng. 2005, 15, 984-992
36. Elam, J.; Libera, J.; Huynh, T.; Feng, H.; Pellin, M. J. Atomic Layer Deposition of Aluminum Oxide in Mesoporous silica gel J. Phys. Chem. C 2010, 114, 17286-17292
37. Rodriguez, J. A.; Hrbek, J. Interaction of Sulfur with Well-Defined Metal and Oxide Surfaces: Unraveling the Mysteries behind Catalyst Poisoning and Desulfurization Acc. Chem. Res. 1999, 32, 719-728