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Thin Solid Films

Volumn 402, Issue 1-2, 2002, Pages 248-261

Thin film atomic layer deposition equipment for semiconductor processing

(5) Sneh, Ofer a Clark Phelps, Robert B a Londergan, Ana R a Winkler, Jereld a Seidel, Thomas E a

a AIXTRON Inc (United States)

Author keywords

Chemical vapor deposition (CVD); Deposition process; Semiconductors

Indexed keywords

DEPOSITION; DIELECTRIC FILMS; LAMINATED COMPOSITES; SEMICONDUCTOR DEVICE MANUFACTURE; SURFACE REACTIONS;

ATOMIC LAYER DEPOSITION (ALD); SEMICONDUCTOR PROCESSING;

ULTRATHIN FILMS;

EID: 0036147929 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/S0040-6090(01)01678-9 Document Type: Article

Times cited : (289)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.