-
1
-
-
33751510228
-
Optical lithography - A historical perspective
-
Ronse, K. Optical lithography - a historical perspective. C. R. Physique 7 (2006), pp. 844-857.
-
(2006)
C. R. Physique
, vol.7
, pp. 844-857
-
-
Ronse, K.1
-
2
-
-
0033872472
-
Future trends in high-resolution lithography
-
DOI 10.1016/S0169-4332(99)00478-X
-
Lawes, R.A. Future trends in high-resolution lithography. Appl. Surf. Sci. 154- 155 (2000), pp. 519-526. (Pubitemid 30573121)
-
(2000)
Applied Surface Science
, vol.154
, pp. 519-526
-
-
Lawes, R.A.1
-
3
-
-
33751537236
-
Optical lithography-present and future challenges
-
DOI 10.1016/j.crhy.2006.10.005, PII S1631070506002179
-
Lin, B.J. Optical lithography - present and future challenges. C. R. Physique 7 (2006), pp. 858-874. (Pubitemid 44835290)
-
(2006)
Comptes Rendus Physique
, vol.7
, Issue.8
, pp. 858-874
-
-
Lin, B.J.1
-
4
-
-
0036643932
-
Advanced optical lithography development, from UV to EUV
-
DOI 10.1016/S0167-9317(02)00427-6, PII S0167931702004276
-
Fay, B. Advanced optical lithography development from UV to EUV. Microelectron. Eng. 61-62 (2002), pp. 11-24. (Pubitemid 34613343)
-
(2002)
Microelectronic Engineering
, vol.61-62
, pp. 11-24
-
-
Fay, B.1
-
6
-
-
0027666673
-
X-ray lithography - An overview
-
Peckerar, M. C. and Maldonado, J. R. X-ray Lithography - An Overview. Proc. IEEE 81 (1993), pp. 1249-1274.
-
(1993)
Proc. IEEE
, vol.81
, pp. 1249-1274
-
-
Peckerar, M.C.1
Maldonado, J.R.2
-
7
-
-
37349124570
-
Ion beam lithography by using highly charged ion beam of Ar
-
DOI 10.1016/j.colsurfa.2007.04.121, PII S0927775707005547
-
Iwamitsu, S., Nagao, M., Shahjada, S., Pahlovy, A., Nishimura, K., Kashihara, M., Momota, S., Nojiri, Y., Taniguchi, J., Miyamoto, I., Nakao, T., Morita, N. and Kawasegi, N. Ion beam lithography by using highly charged ion beam of Ar. Colloids and Surfaces A: Physicochem. Eng. Aspects 313-314 (2008), pp. 407- 410. (Pubitemid 350299943)
-
(2008)
Colloids and Surfaces A: Physicochemical and Engineering Aspects
, vol.313-314
, pp. 407-410
-
-
Iwamitsu, S.1
Nagao, M.2
Pahlovy, S.A.3
Nishimura, K.4
Kashihara, M.5
Momota, S.6
Nojiri, Y.7
Taniguchi, J.8
Miyamoto, I.9
Nakao, T.10
Morita, N.11
Kawasegi, N.12
-
8
-
-
0034273974
-
Electron beam lithography: Resolution limits and applications
-
Vieu, C., Carcenac, F., Pepin, A., Chen, Y., Mejias, M., Lebib, A., Manin- Ferlazzo, L., Couraud, L. and Launois, H. Electron beam lithography: resolution limits and applications. Appl. Surf. Sci. 164 (2000), pp. 111-117.
-
(2000)
Appl. Surf. Sci
, vol.164
, pp. 111-117
-
-
Vieu, C.1
Carcenac, F.2
Pepin, A.3
Chen, Y.4
Mejias, M.5
Lebib, A.6
Manin-Ferlazzo, L.7
Couraud, L.8
Launois, H.9
-
9
-
-
0142037327
-
Imprint of sub-25 nm via and trenches in polymers
-
Chou, S. Y., Krauss, P. R. and Renstrom, P. J. Imprint of sub-25 nm via and trenches in polymers. Appl. Phys. Lett. Vol. 67 No. 21 (1995), pp. 3114-3116.
-
(1995)
Appl. Phys. Lett
, vol.67
, Issue.21
, pp. 3114-3116
-
-
Chou, S.Y.1
Krauss, P.R.2
Renstrom, P.J.3
-
10
-
-
80054930792
-
The ancient technique of imprint lithography could make a mark on next-generation wafer patterning
-
July
-
Derbyshire, B. The ancient technique of imprint lithography could make a mark on next-generation wafer patterning. Semiconductor Manufacturing, July (2004), pp. 19-26.
-
(2004)
Semiconductor Manufacturing
, pp. 19-26
-
-
Derbyshire, B.1
-
11
-
-
5344241941
-
Nanoimprint lithography
-
Chou, S. Y., Krauss, P. R. and Renstrom, P. J. Nanoimprint lithography. J. Vac. Sci. Vol. B14, No. 6 (1996), pp. 4129-4133. (Pubitemid 126582846)
-
(1996)
Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
, vol.14
, Issue.6
, pp. 4129-4133
-
-
Chou, S.Y.1
Krauss, P.R.2
Renstrom, P.J.3
-
12
-
-
0031074686
-
Imprint lithography with sub-10 nm feature size and high throughput
-
PII S0167931796000974
-
Chou, S. Y. and Kraus, P. R. Imprint Lithography with Sub-10 nm Feature Size and High Throughput. Microelectronic Eng. 35 (1997), pp. 237-240. (Pubitemid 127367124)
-
(1997)
Microelectronic Engineering
, vol.35
, Issue.1-4
, pp. 237-240
-
-
Chou, S.Y.1
Krauss, P.R.2
-
13
-
-
0037439678
-
Nanoimprint lithography: An alternative nanofabrication approach
-
PII S0928493102002217
-
Sotomayor Torres, C.M., Zankovych, S., Seekamp, J., Kamm, A.P., Cedeno, C. C., Hoffmann, T., Ahopelto, J., Reuther, F., Pfeiffer, K., Bleidiessel, G., Gruetzner, G., Maximov, M.V. and Heidari, B. Nanoimprint lithography: an alternative nanofabrication approach. Mater. Sci. and Eng. C23 (2003), pp. 23-31. (Pubitemid 36154677)
-
(2003)
Materials Science and Engineering C
, vol.23
, Issue.1-2
, pp. 23-31
-
-
Sotomayor Torres, C.M.1
Zankovych, S.2
Seekamp, J.3
Kam, A.P.4
Clavijo Cedeno, C.5
Hoffmann, T.6
Ahopelto, J.7
Reuther, F.8
Pfeiffer, K.9
Bleidiessel, G.10
Gruetzner, G.11
Maximov, M.V.12
Heidari, B.13
-
14
-
-
2942558559
-
Recent progress in nanoimprint technology and its applications
-
Guo, L.J. Recent progress in nanoimprint technology and its applications. J. Phys. D: Appl. Phys. 37 (2004), pp. R123-R141.
-
(2004)
J. Phys D: Appl. Phys.
, vol.37
-
-
Guo, L.J.1
-
15
-
-
26944450726
-
-
edited by Sotomayor-Torres, C. M., University of Wuppertal, Kluwer Academic/Plenum Publishers, New York 2003
-
Alternative Lithography: Unleashing the potentials of Nanotechnology, edited by Sotomayor-Torres, C. M., University of Wuppertal, Kluwer Academic/Plenum Publishers, New York 2003.
-
Alternative Lithography: Unleashing the potentials of Nanotechnology
-
-
-
16
-
-
0033732466
-
Hot embossing as a method for the fabrication of polymer high aspect ratio structures
-
Becker, H. and Heim, U. Hot embossing as a method for the fabrication of polymer high aspect ratio structures. Sensors and Actuators 83 (2000), pp. 130- 135.
-
(2000)
Sensors and Actuators
, vol.83
, pp. 130-135
-
-
Becker, H.1
Heim, U.2
-
17
-
-
4444250634
-
Organic photonic crystal band edge laser fabricated by direct nanoimprinting
-
Yokoo, A., Suzuki, H. and Notomi, M. Organic Photonic Crystal Band Edge Laser Fabricated by Direct Nanoimprinting. Japanese Journal of Applied Physics 43 (2004), pp. 4009-4011.
-
(2004)
Japanese Journal of Applied Physics
, vol.43
, pp. 4009-4011
-
-
Yokoo, A.1
Suzuki, H.2
Notomi, M.3
-
18
-
-
33947527279
-
Fabrication of photonic crystal structures on light emitting diodes by nanoimprint lithography
-
Hoon Kim, S., Lee K.-D., Kim J.-Y., Kwon M.-K. and Seong-Ju Park. Fabrication of photonic crystal structures on light emitting diodes by nanoimprint lithography. Nanotechnology 18 (2007), pp. 1-5.
-
(2007)
Nanotechnology
, vol.18
, pp. 1-5
-
-
Hoon Kim, S.1
Lee, K.-D.2
Kim, J.-Y.3
Kwon, M.-K.4
Seong-Ju Park5
-
19
-
-
34547828816
-
Fabrication of thermally durable sub-wavelength periodic structures upon inorganic-organic hybrid materials by nano-imprinting
-
DOI 10.1143/JJAP.46.3704
-
Kang, D.J., Bae, B.-S. and Nishi, J. Fabrication of Thermally Durable subwavelength Periodic Structures upon Inorganic Hybrid Materials by Nanoimprinting. Japanese Journal of applied Physics 46(6A) (2007), pp. 3704-3709. (Pubitemid 47245517)
-
(2007)
Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
, vol.46
, Issue.A6
, pp. 3704-3709
-
-
Kang, D.J.1
Bae, B.-S.2
Nishii, J.3
-
20
-
-
0032620446
-
Nanoscale GaAs metal-semiconductor-metal photodetectors fabricated using nanoimprint lithography
-
Yu, Z., Schablitsky, S.J. and Chou, S.Y. Nanoscale GaAs metal-semiconductormetal photodetectors fabricated using nanoimprint lithography. Appl. Phys. Lett. 74(16) (1999), pp. 2381-2383. (Pubitemid 129310453)
-
(1999)
Applied Physics Letters
, vol.74
, Issue.16
, pp. 2381-2383
-
-
Yu, Z.1
Schablitsky, S.J.2
Chou, S.Y.3
-
21
-
-
0034155842
-
Stamp Technology for fabrication of field emitter from organic material
-
Baba, A., Hizukuri, M., Iwamoto, M. and Asano, T. Stamp Technology for fabrication of field emitter from organic material. J. Vac. Sci. Technol. B18(2) (2000), pp. 877-879.
-
(2000)
J. Vac. Sci. Technol
, vol.B18
, Issue.2
, pp. 877-879
-
-
Baba, A.1
Hizukuri, M.2
Iwamoto, M.3
Asano, T.4
-
22
-
-
0031223615
-
Nanoscale silicon field effect transistors fabricated using imprint lithoqraphy
-
Guo, L., Krauss, P.R. and Chou, S.Y. Nanoscale silicon field effect transistors fabricated using imprint lithography. App. Phys. Lett. 71(13) (1997), pp. 1881- 1883. (Pubitemid 127638836)
-
(1997)
Applied Physics Letters
, vol.71
, Issue.13
, pp. 1881-1883
-
-
Guo, L.1
Krauss, P.R.2
Chou, S.Y.3
-
23
-
-
0033130707
-
Nanostructuring of polymers and fabrication of interdigitated electrodes by hot embossing lithography
-
Schift, H., Jaszewski, R.W., David, C. and Gobrecht, J. Nanostructuring of polymers and fabrication of interdigitated electrodes by hot embossing lithography. Microelectron. Eng. 46 (1999), pp. 121-124.
-
(1999)
Microelectron. Eng
, vol.46
, pp. 121-124
-
-
Schift, H.1
Jaszewski, R.W.2
David, C.3
Gobrecht, J.4
-
24
-
-
11744354228
-
Large area high density quantized magnetic disks fabricated using nanoimprinting lithography
-
Wu, W., Cui, B., Sun, X., Zhang, W. ,Zhuang, L. and Kong, L. Large area high density quantized magnetic disks fabricated using nanoimprinting lithography. J. Vac. Sci. Technol. B16(6), pp. 3825-3829.
-
J. Vac. Sci. Technol
, vol.B16
, Issue.6
, pp. 3825-3829
-
-
Wu, W.1
Cui, B.2
Sun, X.3
Zhang W. Zhuang, L.4
Kong, L.5
-
25
-
-
0000669442
-
2 storage density fabricated using nanoimprint lithography and read with proximal probe
-
Krauss, P.R. and Chou, S.Y. Nano-compact disks with 400 Gbit/in2 storage density fabricated using nanoimprint lithography and read with proximal probe. Appl. Phys. Lett. 71(21) (1997), pp. 3174-3176. (Pubitemid 127746260)
-
(1997)
Applied Physics Letters
, vol.71
, Issue.21
, pp. 3174-3176
-
-
Krauss, P.R.1
Chou, S.Y.2
-
26
-
-
4243706604
-
Nanoimprint fabrication of micro-rings for magnetization reversal studies
-
PII S0167931701004488
-
Chen, Y., Lebib, A., Li, S.P., Natali, M., Peyrade, D. and Cambril, E. Nanoimprint fabrication of micro-rings for magnetization reversal studies. Microelectron. Eng. 57-58 (2001), pp. 405-410. (Pubitemid 32798216)
-
(2001)
Microelectronic Engineering
, vol.57-58
, pp. 405-410
-
-
Chen, Y.1
Lebib, A.2
Li, S.P.3
Natali, M.4
Peyrade, D.5
Cambril, E.6
-
27
-
-
0035927018
-
Direct three-dimensional patterning using nanoimprint lithography
-
DOI 10.1063/1.1375006
-
Li, M., Chen, L. and Chou, S.Y. Direct three-dimensional patterning using nanoimprint lithography. Appl. Phys. Lett. 78(21) (2001), pp. 3322-3324. (Pubitemid 33611552)
-
(2001)
Applied Physics Letters
, vol.78
, Issue.21
, pp. 3322-3324
-
-
Li, M.1
Chen, L.2
Chou, S.Y.3
-
28
-
-
0037493097
-
Nano-Imprint - Molding Resists for Lithography
-
Schift, H., Park, S. and Gobrecht, J. Nano-Imprint - Molding Resists for Lithography. J. Photopolym. Sci. Technol 16 No.3 (2003), pp. 435-438.
-
(2003)
J. Photopolym. Sci. Technol
, vol.16
, Issue.3
, pp. 435-438
-
-
Schift, H.1
Park, S.2
Gobrecht, J.3
-
29
-
-
33745741576
-
Squeeze flow characterisation of thermoplastic polymer
-
Jackson, A.P., Liu, X.-L. and Paton, R. Squeeze flow characterisation of thermoplastic polymer. Composite Structures 75 (2006), pp. 179-184.
-
(2006)
Composite Structures
, vol.75
, pp. 179-184
-
-
Jackson, A.P.1
Liu, X.-L.2
Paton, R.3
-
30
-
-
0034508819
-
Flow behaviour of thin polymer films used for hot embossing lithography
-
DOI 10.1016/S0167-9317(00)00414-7
-
Heyderman, L.J., Schift H., David C., Gobrecht, J. and Schweizer T. Flow behaviour of thin films used for hot embossing lithography. Microelectronic Eng. 54 (2000), pp. 229-245. (Pubitemid 32035506)
-
(2000)
Microelectronic Engineering
, vol.54
, Issue.3-4
, pp. 229-245
-
-
Heyderman, L.J.1
Schift, H.2
David, C.3
Gobrecht, J.4
Schweizer, T.5
-
31
-
-
0035422490
-
A contribution to the flow behaviour of thin polymer films during hot embossing lithography
-
DOI 10.1016/S0167-9317(01)00569-X, PII S016793170100569X
-
Scheer, H.-C. and Schulz, H. A contribution to the flow behaviour of thin polymer films during hot embossing lithography. Microelectronic Eng. 56 (2001), pp. 311-332. (Pubitemid 32776204)
-
(2001)
Microelectronic Engineering
, vol.56
, Issue.3-4
, pp. 311-332
-
-
Scheer, H.-C.1
Schulz, H.2
-
32
-
-
32044442937
-
Impact of molecular weight of polymers and shear rate effects for nanoimprint lithography
-
DOI 10.1016/j.mee.2005.07.090, PII S0167931705004399
-
Schulz, H., Wissen, M., Bogdanski, N., Scheer, H.-C., Mattes, K. and Friedrich, Ch. Impact of molecular weight of polymers and shear rate effects for nanoimprint lithography. Microelectron. Eng. 83 (2006), pp. 259-280. (Pubitemid 43199287)
-
(2006)
Microelectronic Engineering
, vol.83
, Issue.2
, pp. 259-280
-
-
Schulz, H.1
Wissen, M.2
Bogdanski, N.3
Scheer, H.-C.4
Mattes, K.5
Friedrich, Ch.6
-
33
-
-
0036153312
-
Characteristics of melt shear viscosity during extrusion of polymers
-
DOI 10.1016/S0142-9418(01)00088-5, PII S0142941801000885
-
Liang, J.-Z. Characteristics of melt shear viscosity during extrusion of polymers. Polymer Testing 21 (2002), pp. 307-311. (Pubitemid 34105443)
-
(2002)
Polymer Testing
, vol.21
, Issue.3
, pp. 307-311
-
-
Liang, J.-Z.1
-
34
-
-
13244283408
-
Mold deformation in nanoimprint lithography
-
DOI 10.1116/1.1815299
-
Lazzarino, F., Gourgon, C., Schiavone, P. and Perret, C. Mold deformation in nanoimprint lithography. J. Vac. Sci. Technol. B22(6) (2004), pp. 3318-3322. (Pubitemid 40185121)
-
(2004)
Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
, vol.22
, Issue.6
, pp. 3318-3322
-
-
Lazzarino, F.1
Gourgon, C.2
Schiavone, P.3
Perret, C.4
-
35
-
-
44149118908
-
Stamp deformation and its influence on residual layer homogeneity in thermal nanoimprint lithography
-
Merino, S., Retolaza, A., Schift, H., and Trabadelo, V. Stamp deformation and its influence on residual layer homogeneity in thermal nanoimprint lithography. Microelectron. Eng. 85 (2008), pp. 877-880.
-
(2008)
Microelectron. Eng
, vol.85
, pp. 877-880
-
-
Merino, S.1
Retolaza, A.2
Schift, H.3
Trabadelo, V.4
-
36
-
-
34247572491
-
Coarse-grain method for modeling of stamp and substrate deformation in nanoimprint
-
DOI 10.1016/j.mee.2007.01.007, PII S0167931707000512, Proceedings of the 32nd International Conference on Micro- and Nano-Engineering
-
Sirotkin, V., Svintsov, A., Schift, H., and Zaitsev S. Coarse-grain method for modelling of stamp and substrate deformation in nanoimprint. Microelectron. Eng. 84 (2007), pp. 868-871. (Pubitemid 46680538)
-
(2007)
Microelectronic Engineering
, vol.84
, Issue.5-8
, pp. 868-871
-
-
Sirotkin, V.1
Svintsov, A.2
Schift, H.3
Zaitsev, S.4
-
38
-
-
0037207693
-
Influence of pattern density in nanoimprint lithography
-
Gourgon, C., Perret, C., Micouin, G., Lazzarino, F., Tortal, J. H. and Joubert, O. Influence of pattern density in nanoimprint lithography. J. Vac. Sci. Technol. B21(1) (2003), pp. 98-105. (Pubitemid 36289638)
-
(2003)
JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY B MICROELECTRONICS AND NANOMETER STRUCTURES
, vol.21
, Issue.1
, pp. 98-105
-
-
Gourgon, C.1
Perret, C.2
Micouin, G.3
Lazzarino, F.4
Tortai, J.H.5
Joubert, O.6
Grolier, J.-P.E.7
-
39
-
-
44149087144
-
Imprintability of polymer for thermal nanoimprint
-
Scheer, H.-C., Bogdanski, N., Wissen, M. and Möllenbeck, S. Imprintability of polymer for thermal nanoimprint. Microelectron. Eng. 85 (2008), pp. 890-896.
-
(2008)
Microelectron. Eng
, vol.85
, pp. 890-896
-
-
Scheer, H.-C.1
Bogdanski, N.2
Wissen, M.3
Möllenbeck, S.4
-
40
-
-
0037682242
-
Local mass transport and its effect on global pattern replication during hot embossing
-
Schulz, H., Wissen, M. and Scheer, H.-C. Local mass transport and its effect on global pattern replication during hot embossing. Microelectronic Eng. 67-68 (2003), pp. 657-663.
-
(2003)
Microelectronic Eng
, vol.67-68
, pp. 657-663
-
-
Schulz, H.1
Wissen, M.2
Scheer, H.-C.3
-
41
-
-
44149091962
-
Pressure and resist thickness dependency of resist time evolutions profiles in nanoimprint lithography
-
Hirai, Y., Onishi, Y., Tanabe, T., Shibata, M., Iwasaki, T. and Iriye, Y. Pressure and resist thickness dependency of resist time evolutions profiles in nanoimprint lithography. Microelectron. Eng. 85 (2008), pp. 842-845.
-
(2008)
Microelectron. Eng
, vol.85
, pp. 842-845
-
-
Hirai, Y.1
Onishi, Y.2
Tanabe, T.3
Shibata, M.4
Iwasaki, T.5
Iriye, Y.6
-
42
-
-
13244279801
-
Simulation and experimental study of polymer deformation in nanoimprint lithography
-
DOI 10.1116/1.1826058
-
Hirai, Y., Konishi, T., Yoshikawa, T. and Yoshida, S. Simulation and experimental study of polymer deformation in nanoimprint lithography. J. Vac. Sci. Technol. B 22(6) (2004), pp. 3288-3293. (Pubitemid 40185116)
-
(2004)
Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
, vol.22
, Issue.6
, pp. 3288-3293
-
-
Hirai, Y.1
Konishi, T.2
Yoshikawa, T.3
Yoshida, S.4
-
43
-
-
44149124095
-
Residual layer thickness in nanoimprint: Experiments and coarse-grain simulation
-
Kehagias, N., Reboud, V., Sotomayor-Torres, C. M., Sirotkin, V., Svintsov, A. and Zaitsev, S. Residual layer thickness in nanoimprint: Experiments and coarse-grain simulation. Microelectron. Eng. 85 (2008), pp. 846-849.
-
(2008)
Microelectron. Eng
, vol.85
, pp. 846-849
-
-
Kehagias, N.1
Reboud, V.2
Sotomayor-Torres, C.M.3
Sirotkin, V.4
Svintsov, A.5
Zaitsev, S.6
-
44
-
-
15344346362
-
Analysis of the nanoimprint lithography with a viscous model
-
DOI 10.1016/j.mee.2005.01.024, PII S0167931705000262
-
Young, W.-B. Analysis of the nanoimprint lithography with viscous flow model. Microelectron. Eng. 77 (2005), pp. 405-411. (Pubitemid 40391487)
-
(2005)
Microelectronic Engineering
, vol.77
, Issue.3-4
, pp. 405-411
-
-
Young, W.-B.1
-
45
-
-
33748283408
-
Viscous flow simulation in nanoimprint using coarse-grain method
-
DOI 10.1016/j.mee.2006.01.010, PII S0167931706000219
-
Sirotkin, V., Svintsov, A., Zaitsev, S. and Schift, H. Viscous flow simulation in nanoimprint using coarse-grain method. Microelectron. Eng. 83 (2006), pp. 880- 883. (Pubitemid 44316456)
-
(2006)
Microelectronic Engineering
, vol.83
, Issue.SPEC. ISS.4-9
, pp. 880-883
-
-
Sirotkin, V.1
Svintsov, A.2
Zaitsev, S.3
Schift, H.4
-
46
-
-
27944505464
-
Impact of polymer film thickness and cavity size on polymer flow during embossing: Toward process design rules for nanoimprint lithography
-
DOI 10.1088/0960-1317/15/12/025, PII S0960131705020188
-
Rowland, H.D., Sun, A. C., Schunk, P.R. and King, W.P. Impact of polymer film thickness and cavity size on polymer flow during embossing: toward process design rules for nanoimprinting lithography. J. Micromech. Microeng. 15 (2005), pp. 2414-2425. (Pubitemid 41677110)
-
(2005)
Journal of Micromechanics and Microengineering
, vol.15
, Issue.12
, pp. 2414-2425
-
-
Rowland, H.D.1
Sun, A.C.2
Schunk, P.R.3
King, W.P.4
-
47
-
-
33646061050
-
Profile evolution during thermal nanoimprint
-
Scheer H.-C., Bogdanski N., Wissen M., Konishi T., Hirai Y. Profile evolution during thermal nanoimprint. Microelectronic Eng. 83 (2006), pp. 843-846.
-
(2006)
Microelectronic Eng
, vol.83
, pp. 843-846
-
-
Scheer, H.-C.1
Bogdanski, N.2
Wissen, M.3
Konishi, T.4
Hirai, Y.5
-
48
-
-
33845258760
-
Thermal imprint with negligibly low residual layer
-
DOI 10.1116/1.2388964
-
Bogdanski, N., Wissen, M., Möllenbeck, S., and Scheer, H.-C. Thermal Imprint with negligibly low residual layer. J. Vac. Sci. B24(6) (2006), pp. 2998-3001. (Pubitemid 44866456)
-
(2006)
Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
, vol.24
, Issue.6
, pp. 2998-3001
-
-
Bogdanski, N.1
Wissen, M.2
Mollenbeck, S.3
Scheer, H.-C.4
-
49
-
-
14944340239
-
Temperature-reduced nanoimprint lithography for thin and uniform residual layers
-
DOI 10.1016/j.mee.2004.12.076, PII S0167931704006136, Proceedings of the 30th International Conference on Micro- and Nano-Engineering
-
Bogdanski, N., Wissen, M., Ziegler, A. and Scheer, H.-C. Temperature-reduced nanoimprint lithography for thin and uniform residual layers. Microelectron. Eng. 78-79 (2005), pp. 598-604. (Pubitemid 40371023)
-
(2005)
Microelectronic Engineering
, vol.78-79
, Issue.1-4
, pp. 598-604
-
-
Bogdanski, N.1
Wissen, M.2
Ziegler, A.3
Scheer, H.-C.4
-
50
-
-
34247591461
-
Structure size dependent recovery of thin polystyrene layers in thermal imprint lithography
-
DOI 10.1016/j.mee.2007.01.093, PII S0167931707000494, Proceedings of the 32nd International Conference on Micro- and Nano-Engineering
-
Bogdanski, N., Wissen, M., Möllenbeck, S. and Scheer, H.-C. Structure size dependent recovery of thin polystyrene layers in thermal imprint lithography. Microelectron. Eng. 84 (2007), pp. 860-863. (Pubitemid 46678304)
-
(2007)
Microelectronic Engineering
, vol.84
, Issue.5-8
, pp. 860-863
-
-
Bogdanski, N.1
Wissen, M.2
Mollenbeck, S.3
Scheer, H.-C.4
-
51
-
-
0038359116
-
A non-destructive method for the removal residual resist in imprinted patterns
-
Chen, Y., Macintyre, D.S. and Thoms, S. A non-destructive method for the removal residual resist in imprinted patterns. Microelectronic Eng. 67-68 (2003), pp. 245-251.
-
(2003)
Microelectronic Eng
, vol.67-68
, pp. 245-251
-
-
Chen, Y.1
Macintyre, D.S.2
Thoms, S.3
-
52
-
-
0034207339
-
Tri-layer systems for nanoimprint lithography with an improved process latitude
-
Lebib, A., Chen, Y., Carcenac, F., Cambril, E., Mann, L., Couraud, L. and Launois, H. Tri-layer systems for nanoimprint lithography with an improved process latitude. Microelectronic Eng. 53 (2000), pp. 175-178.
-
(2000)
Microelectronic Eng
, vol.53
, pp. 175-178
-
-
Lebib, A.1
Chen, Y.2
Carcenac, F.3
Cambril, E.4
Mann, L.5
Couraud, L.6
Launois, H.7
-
53
-
-
0036643868
-
Room-temperature and low-pressure nanoimprint lithography
-
DOI 10.1016/S0167-9317(02)00485-9, PII S0167931702004859
-
Lebib, Y., Chen, Y., Cambril, E., Youinou, P., Studer, V., Natali, M., Pepin, A., Janssen, H.M. and Sijbesma, R.P. Room-temperature and low-pressure nanoimprint lithography. Microelectron. Eng. 61-62 (2002), pp. 371-377. (Pubitemid 34613389)
-
(2002)
Microelectronic Engineering
, vol.61-62
, pp. 371-377
-
-
Lebib, A.1
Chen, Y.2
Cambril, E.3
Youinou, P.4
Studer, V.5
Natali, M.6
Pepin, A.7
Janssen, H.M.8
Sijbesma, R.P.9
-
54
-
-
0038697354
-
Lift-off process for nanoimprint lithography
-
Carlberg, P., Grazyck, M., Sarwe, E.-L., Maximov, I., Beck, M. and Montelius, L. Lift-off process for nanoimprint lithography. Microelectron. Eng. 67-68 (2003), pp. 203-207.
-
(2003)
Microelectron. Eng
, vol.67-68
, pp. 203-207
-
-
Carlberg, P.1
Grazyck, M.2
Sarwe, E.-L.3
Maximov, I.4
Beck, M.5
Montelius, L.6
-
55
-
-
9644257711
-
Multilayer resist methods for nanoimprint lithography on nonflat surfaces
-
Sun, X., Zhuang, L., Zhang, W. and Chou, S.Y. Multilayer resist methods for nanoimprint lithography on nonflat surfaces. J. Vac. Sci. Technol. B16(6) (1998), pp. 3922-3925. (Pubitemid 128601045)
-
(1998)
Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
, vol.16
, Issue.6
, pp. 3922-3925
-
-
Sun, X.1
Zhuang, L.2
Zhang, W.3
Chou, S.Y.4
-
56
-
-
0031685664
-
Hot embossing in polymers as a direct way to pattern resist
-
PII S016793179800135X
-
Jaszewski, R.W., Schift, H., Gobrecht, J. and Smith, P. Hot embossing in polymers as a direct way to pattern resist. Microelectronic Eng. 41/42 (1998), pp. 575-578. (Pubitemid 128651152)
-
(1998)
Microelectronic Engineering
, vol.41-42
, pp. 575-578
-
-
Jaszewski, R.W.1
Schift, H.2
Gobrecht, J.3
Smith, P.4
-
57
-
-
0032649908
-
Polymer issues in nanoimprinting technique
-
Gottschalch, F., Hoffmann, T., Sotomayor Torres, C.M., Schulz, H. and Scheer, H.-C. Polymer issues in nanoimprinting technique. Solid-State Electronics 43 (1999), pp. 1079-1083.
-
(1999)
Solid-State Electronics
, vol.43
, pp. 1079-1083
-
-
Gottschalch, F.1
Hoffmann, T.2
Sotomayor Torres, C.M.3
Schulz, H.4
Scheer, H.-C.5
-
58
-
-
0347902948
-
Problems of the nanoimprinting technique for nanometer scale pattern definition
-
Scheer, H.C., Schulz, H., Hoffmann, T. and Sotomayor Torres, C.M. Problem of the nanoimprinting technique for nanometer scale pattern definition. J. Vac. Sci. B16(6) (1998), pp. 3917-3921. (Pubitemid 128601044)
-
(1998)
Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
, vol.16
, Issue.6
, pp. 3917-3921
-
-
Scheer, H.-C.1
Schulz, H.2
Hoffmann, T.3
Sotomayor Torres, C.M.4
-
59
-
-
80054878214
-
Suitability of new polymer materials with adjustable glass temperature for nanoimprinting
-
Pfeiffer, K., Bleidiessel, G., Grueztner, G., Schulz, H., Hoffmann, T., Scheer, H.- C., Sotomayor Torres, C. M. and Ahopelto, J. Suitability of new polymer materials with adjustable glass temperature for nanoimprinting. Micro- and Nanoengineering Conference, MNE '98, Leuven.
-
Micro- and Nanoengineering Conference, MNE '98, Leuven
-
-
Pfeiffer, K.1
Bleidiessel, G.2
Grueztner, G.3
Schulz, H.4
Hoffmann, T.5
Scheer, H.-C.6
Sotomayor Torres, C.M.7
Ahopelto, J.8
-
60
-
-
0036643575
-
Electron beam photoresists for nanoimprint lithography
-
DOI 10.1016/S0167-9317(02)00429-X, PII S016793170200429X
-
Gourgon, C., Perret, C. and Micouin, G. Electron beam photoresist for nanoimprint lithography. Microelectron. Eng. 61-62 (2002), pp. 385-392. (Pubitemid 34613391)
-
(2002)
Microelectronic Engineering
, vol.61-62
, pp. 385-392
-
-
Gourgon, C.1
Perret, C.2
Micouin, G.3
-
61
-
-
0034205422
-
High density fluorocarbon plasma etching for new resists suitable for nano-imprint lithography
-
Gaboriau, F., Peignon, M.C., Barreau, A., Turban, G. and Cardinaud, Ch. High density fluorocarbon plasma etching for new resists suitable for nano-imprint lithography. Microelectronic Eng. 53 (2000), pp. 501-505.
-
(2000)
Microelectronic Eng
, vol.53
, pp. 501-505
-
-
Gaboriau, F.1
Peignon, M.C.2
Barreau, A.3
Turban, G.4
Cardinaud, Ch.5
-
62
-
-
0034205522
-
Novel linear and crosslinking polymers for nanoimprinting with high etch resistance
-
Pfeiffer, K., Finck, M., Bleidiessel, G., Grueztner, G., Schulz, H., Scheer, H.-C., Hoffmann, T., Sotomayor Torres, C.M., Gaboriau, F., and Cardinaud, Ch. Novel linear and crosslinking polymers for nanoimprinting with high etch resistance. Microelectronic Eng. 53 (2000), pp. 411-414.
-
(2000)
Microelectronic Eng.
, vol.53
, pp. 411-414
-
-
Pfeiffer, K.1
Finck, M.2
Bleidiessel, G.3
Grueztner, G.4
Schulz, H.5
Scheer, H.-C.6
Hoffmann, T.7
Sotomayor Torres, C.M.8
Gaboriau, F.9
Cardinaud, Ch.10
-
63
-
-
23044523167
-
New polymer materials for nanoimprinting
-
Schulz, H., cheer, H.-C., Hoffmann, T., Sotomayor Torres, C. M., Pfeiffer, K., Bleidiessel, G., Grueztner, G., Cardinaud, Ch., Gaboriau, F., Peignon, M.-C., Ahopelto, J. and Heidari, B. New polymer materials for nanoimprinting. J. Vac. Sci. Technol. B18(4) (2000), pp. 1861-1865.
-
(2000)
J. Vac. Sci. Technol.
, vol.B18
, Issue.4
, pp. 1861-1865
-
-
Schulz, H.1
Cheer, H.-C.2
Hoffmann, T.3
Sotomayor Torres, C.M.4
Pfeiffer, K.5
Bleidiessel, G.6
Grueztner, G.7
Cardinaud, Ch.8
Gaboriau, F.9
Peignon, M.-C.10
Ahopelto, J.11
Heidari, B.12
-
64
-
-
0031074741
-
Embossing of nanoscale features and environments
-
PII S0167931796002080
-
Casey, B.G., Monaghan, W. and Wilkinson, C.D.W. Embossing of Nanoscale Features and Environments. Microelectronic Eng. 35 (1997), pp. 393-396. (Pubitemid 127367161)
-
(1997)
Microelectronic Engineering
, vol.35
, Issue.1-4
, pp. 393-396
-
-
Casey, B.G.1
Monaghan, W.2
Wilkinson, C.D.W.3
-
65
-
-
0033364870
-
Thermoplastic structuring of thin polymer films
-
DOI 10.1016/S0924-4247(99)00237-X
-
Dreuth, H. and Heiden, C. Thermoplastic structuring of thin polymer films. Sensors and Actuators 78 (1999), pp. 198-204. (Pubitemid 30523581)
-
(1999)
Sensors and Actuators, A: Physical
, vol.78
, Issue.2
, pp. 198-204
-
-
Dreuth, H.1
Heiden, C.2
-
66
-
-
0033356190
-
63-nm-pitch pit pattern fabricated on polycarbonate surface by direct nanoprinting
-
Yokoo, A., Nakao, M., Yoshikawa, H., Masuda, H. and Tamamura, T. 63-nm- Pitch Pit Pattern Fabricated on Polycarbonate surface by Direct Nanoimprinting. Jpn. J. Appl. Phys. 38 (1999), pp. 7268-7271. (Pubitemid 30557132)
-
(1999)
Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
, vol.38
, Issue.B12
, pp. 7268-7271
-
-
Yokoo, A.1
Nakao, M.2
Yoshikawa, H.3
Masuda, H.4
Tamamura, T.5
-
67
-
-
0038020951
-
Fine pattern fabrication on glass surface by imprint lithography
-
Hirai, Y., Kanakugi, K., Yamaguchi, T., Yao, K., Kitakawa, S., and Tanaka, Y. Fine pattern fabrication on glass surface by imprint lithography. Microelectron. Eng. 67-68 (2003), pp. 237-244.
-
(2003)
Microelectron. Eng.
, vol.67-68
, pp. 237-244
-
-
Hirai, Y.1
Kanakugi, K.2
Yamaguchi, T.3
Yao, K.4
Kitakawa, S.5
Tanaka, Y.6
-
68
-
-
0037142072
-
Ultrafast and direct imprint of nanostructures in silicon
-
DOI 10.1038/nature00792
-
Chou, S.Y., Keimel, C. and Gu, J. Ultrafast and direct imprint of nanostructures in silicon. Nature 417 (2002), pp. 835-837. (Pubitemid 34670326)
-
(2002)
Nature
, vol.417
, Issue.6891
, pp. 835-837
-
-
Chou, S.Y.1
Keimel, C.2
Gu, J.3
-
69
-
-
34247580210
-
Fabrication of Si mold with smooth side wall by new plasma etching process
-
DOI 10.1016/j.mee.2007.01.216, PII S0167931707001153, Proceedings of the 32nd International Conference on Micro- and Nano-Engineering
-
Kawata, H., Yasuda, M. and Hirai, Y. Fabrication of Si mold with smooth side wall by new plasma etching process. Microelectron. Eng. 84 (2007), pp. 1140- 1143. (Pubitemid 46678353)
-
(2007)
Microelectronic Engineering
, vol.84
, Issue.5-8
, pp. 1140-1143
-
-
Kawata, H.1
Yasuda, M.2
Hirai, Y.3
-
70
-
-
0036643783
-
Fabrication of Si-based nanoimprint stamps with sub-20 nm features
-
DOI 10.1016/S0167-9317(02)00488-4, PII S0167931702004884
-
Maximov, I., Sarwe, E.-L., Beck, M., Deppert, K., Graczyk, M., Magnusson, M.H. and Montelius L. Fabrication of Si-based nanoimprint stamps with sub-20 nm features. Microelectron. Eng. 61-62 (2002), pp. 449-454. (Pubitemid 34613400)
-
(2002)
Microelectronic Engineering
, vol.61-62
, pp. 449-454
-
-
Maximov, I.1
Sarwe, E.-L.2
Beck, M.3
Deppert, K.4
Graczyk, M.5
Magnusson, M.H.6
Montelius, L.7
-
71
-
-
57249090773
-
Fabrication of a silicon oxide stamp by edge lithography reinforced with silicon nitride for nanoimprint lithography
-
Zhao, Y., Berenschot, E., de Boer, M., Jansen, H., Tas, N., Huskens, J. and Elwenspoek, M. Fabrication of a silicon oxide stamp by edge lithography reinforced with silicon nitride for nanoimprint lithography. J. Micromech. Eng. 18 (2008), pp. 1-6.
-
(2008)
J. Micromech. Eng.
, vol.18
, pp. 1-6
-
-
Zhao, Y.1
Berenschot, E.2
De Boer, M.3
Jansen, H.4
Tas, N.5
Huskens, J.6
Elwenspoek, M.7
-
72
-
-
0035450318
-
Low temperature nanoimprint lithography using silicon nitride molds
-
PII S016793170100435X
-
Alkaisi, M.M., Blaikie, R.J. and McNab, S.J. Low temperature nanoimprint lithography using silicon nitride molds. Microelectron. Eng. 57-58 (2001), pp. 367- 373. (Pubitemid 32798211)
-
(2001)
Microelectronic Engineering
, vol.57-58
, pp. 367-373
-
-
Alkaisi, M.M.1
Blaikie, R.J.2
McNab, S.J.3
-
73
-
-
41549093718
-
A study on fabrication of silicon mold for polymer hot-embossing using focused ion beam milling
-
Youn, S.-W., Okuyama, C., Takahashi, M. and Maeda, R. A study on fabrication of silicon mold for polymer hot-embossing using focused ion beam milling. Journal of Material Processing Technology 201 (2008), pp. 548-553.
-
(2008)
Journal of Material Processing Technology
, vol.201
, pp. 548-553
-
-
Youn, S.-W.1
Okuyama, C.2
Takahashi, M.3
Maeda, R.4
-
74
-
-
67349143725
-
Fabrication of silicon micro-mould for polymer replication using focused ion beam
-
Kim, C.S., Park, J., Chu, W. S., Jang, D.Y., Kim, S.D. and Ahn, S.H. Fabrication of silicon micro-mould for polymer replication using focused ion beam. Microelectron. Eng. 86 (2009), pp. 556-560.
-
(2009)
Microelectron. Eng.
, vol.86
, pp. 556-560
-
-
Kim, C.S.1
Park, J.2
Chu, W.S.3
Jang, D.Y.4
Kim, S.D.5
Ahn, S.H.6
-
75
-
-
34247627440
-
2 layer
-
DOI 10.1016/j.mee.2007.01.102, PII S0167931707000822, Proceedings of the 32nd International Conference on Micro- and Nano-Engineering
-
Byeon, K.-J., Yang, K.-Y. and Lee, H. Thermal imprint lithography using submicron sized nickel template coated with thin SiO2 layer. Microelectron. Eng. 84 (2007), pp. 1003-1006. (Pubitemid 46678328)
-
(2007)
Microelectronic Engineering
, vol.84
, Issue.5-8
, pp. 1003-1006
-
-
Byeon, K.-J.1
Yang, K.-Y.2
Lee, H.3
-
76
-
-
34247620822
-
Fabrication of 50 nm patterned nickel stamp with hot embossing and electroforming process
-
DOI 10.1016/j.mee.2007.01.101, PII S0167931707000779, Proceedings of the 32nd International Conference on Micro- and Nano-Engineering
-
Hong S.-H., Lee J.-H. and Lee, H. Fabrication of 50 nm patterned nickel stamp with hot embossing and electroforming process. Microelectron. Eng. 84 (2007), pp. 977-979. (Pubitemid 46678324)
-
(2007)
Microelectronic Engineering
, vol.84
, Issue.5-8
, pp. 977-979
-
-
Hong, S.-H.1
Lee, J.-H.2
Lee, H.3
-
77
-
-
0036643698
-
Polymer stamps for nanoimprinting
-
DOI 10.1016/S0167-9317(02)00577-4, PII S0167931702005774
-
Pfeiffer, K., Fink, M., Ahrens, G., Gruetzner, G., Reuther, F., Seekamp, J., Zankovych, S., Sotomayor Torres, C. M., Maximov, I., Beck, M., Graczyk, M., Montelius, L., Schulz, H., Scheer, H.-C. and Steingrueber, F. Polymer stamps for nanoimprinting. Microelectron. Eng. 61-62 (2002), pp. 393-398. (Pubitemid 34613392)
-
(2002)
Microelectronic Engineering
, vol.61-62
, pp. 393-398
-
-
Pfeiffer, K.1
Fink, M.2
Ahrens, G.3
Gruetzner, G.4
Reuther, F.5
Seekamp, J.6
Zankovych, S.7
Sotomayor Torres, C.M.8
Maximov, I.9
Beck, M.10
Graczyk, M.11
Montelius, L.12
Schulz, H.13
Scheer, H.-C.14
Steingrueber, F.15
-
78
-
-
0034315092
-
Master replication into thermosetting polymers for nanoimprinting
-
DOI 10.1116/1.1319821
-
Schulz, H., Lyebyedev, D., Scheer, H.-C., Pfeiffer, K., Bleidiessel, G., Gruztner, G. and Ahopelto, J. Master replication into thermosetting polymer for nanoimprinting. J. Vac. Sci. Technol. B18(6) (2000), pp. 3582-3585. (Pubitemid 32088261)
-
(2000)
Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
, vol.18
, Issue.6
, pp. 3582-3585
-
-
Schulz, H.1
Lyebyedyev, D.2
Scheer, H.-C.3
Pfeiffer, K.4
Bleidiessel, G.5
Grutzner, G.6
Ahopelto, J.7
-
79
-
-
0036643699
-
First and second generation purely thermoset stamps for hot embossing
-
DOI 10.1016/S0167-9317(02)00512-9, PII S0167931702005129
-
Roos, M., Schulz, H., Bendfeldt, L., Fink, M., Pfeiffer, K. and Scheer, H.-C. First and second generation purely thermoset stamps for hot embossing. Microelectron. Eng. 61-62 (2002), pp. 399-405. (Pubitemid 34613393)
-
(2002)
Microelectronic Engineering
, vol.61-62
, pp. 399-405
-
-
Roos, N.1
Schulz, H.2
Bendfeldt, L.3
Fink, M.4
Pfeiffer, K.5
Scheer, H.-C.6
-
80
-
-
36148997258
-
Direct stamp fabrication for NIL and hot embossing using HSQ
-
DOI 10.1016/j.mee.2007.01.122, PII S0167931707002560
-
Gadegaard, N. and McCloy, D. Direct stamp fabrication for NIL and hot embossing using HSQ. Microelectron. Eng. 84 (2007), pp. 2785-2789. (Pubitemid 350116269)
-
(2007)
Microelectronic Engineering
, vol.84
, Issue.12
, pp. 2785-2789
-
-
Gadegaard, N.1
McCloy, D.2
-
81
-
-
18544367818
-
Epoxy resins as stamps for hot embossing of microstructures and microfluidic channels
-
DOI 10.1016/j.snb.2004.11.035, PII S0925400504008007
-
Koerner, T., Brown, L., Xie, R. and Oleschuk, R.D. Epoxy resins as stamps for hot embossing of microstructures and microfluidic channels. Sensors and Actuators B 107 (2005), pp. 632-639. (Pubitemid 40655003)
-
(2005)
Sensors and Actuators, B: Chemical
, vol.107
, Issue.2
, pp. 632-639
-
-
Koerner, T.1
Brown, L.2
Xie, R.3
Oleschuk, R.D.4
-
82
-
-
0942300056
-
Imprinting polymer film on patterned substrates
-
Tan, L., Kong, Y.P., Bao, L.-R., Huang, X.D., Guo, L.J., Pang, S.W. and Yee, A.F. Imprinting polymer film on patterned substrates. J. Vac. Sci. Technol. B21(6) (2003), pp. 2742-2748.
-
(2003)
J. Vac. Sci. Technol
, vol.B21
, Issue.6
, pp. 2742-2748
-
-
Tan, L.1
Kong, Y.P.2
Bao, L.-R.3
Huang, X.D.4
Guo, L.J.5
Pang, S.W.6
Yee, A.F.7
-
83
-
-
14644422614
-
Fabrication and surface treatment of silicon mold for polymer microarray
-
DOI 10.1016/j.surfcoat.2004.08.052, PII S0257897204006930
-
Jo, S.-B., Lee, M.-W., Park, S.G., Suh, J.-K., and O, B.-h. Fabrication and surface treatment of silicon mold for polymer microarray. Surface & Coating Technology 188-189 (2004), pp. 452-458. (Pubitemid 40322825)
-
(2004)
Surface and Coatings Technology
, vol.188-189
, Issue.SPEC.ISS.1-3
, pp. 452-458
-
-
Jo, S.-B.1
Lee, M.-W.2
Park, S.-G.3
Suh, J.-K.4
O, B.-H.5
-
84
-
-
0031069260
-
Properties of thin anti-adhesive films used for the replication of microstructures in polymers
-
PII S0167931796002031
-
Jaszewski, R.W., Schift, H., Gröning, P. and Margaritondo, G. Properties of thin anti-adhesive films used for the replication of microstructures in polymers. Microelectronic Eng. 35 (1997), pp. 381-384. (Pubitemid 127367158)
-
(1997)
Microelectronic Engineering
, vol.35
, Issue.1-4
, pp. 381-384
-
-
Jaszewski, R.W.1
Schift, H.2
Groning, P.3
Margaritondo, G.4
-
85
-
-
0032637821
-
The deposition of anti-adhesive ultra-thin Teflon-like films and their interaction with polymer during hot embossing
-
Jaszewski, R.W., Schift, H., Schnyder, B., Schneuwly, A. and Gröning, P. The deposition of anti-adhesive ultra-thin Teflon-like films and their interaction with polymer during hot embossing. Appl. Surface Sci. 143 (1999), pp. 301-308.
-
(1999)
Appl. Surface Sci
, vol.143
, pp. 301-308
-
-
Jaszewski, R.W.1
Schift, H.2
Schnyder, B.3
Schneuwly, A.4
Gröning, P.5
-
86
-
-
0036643642
-
Improving stamps for 10 nm level wafer scale nanoimprint lithography
-
DOI 10.1016/S0167-9317(02)00464-1, PII S0167931702004641
-
Beck, M., Graczyk, M., Maximov, I., Sarwe, E.-L., Ling, T.G.I, Keil, M. and Montelius, L. Improving stamps for 10 nm level wafer scale nanoimprint lithography. Microelectron. Eng. 61-62 (2002), pp. 441-448. (Pubitemid 34613399)
-
(2002)
Microelectronic Engineering
, vol.61-62
, pp. 441-448
-
-
Beck, M.1
Graczyk, M.2
Maximov, I.3
Sarwe, E.-L.4
Ling, T.G.I.5
Keil, M.6
Montelius, L.7
-
87
-
-
0038020956
-
Nanostructuring of antiadhesive layer by hot embossing lithography
-
Park, S., Padeste, C., Shift, H. and Gobrecht, J. Nanostructuring of antiadhesive layer by hot embossing lithography. Microelectron. Eng. 67-68 (2003), pp. 252-258.
-
(2003)
Microelectron. Eng.
, vol.67-68
, pp. 252-258
-
-
Park, S.1
Padeste, C.2
Shift, H.3
Gobrecht, J.4
-
88
-
-
24144476257
-
Controlled co-evaporation of silanes for nanoimprint stamps
-
Schift, H., Saxer, S., Park, S., Padeste, C., Pieles, U. and Gobrecht, J. Controlled co-evaporation of silanes for nanoimprint stamps. Nanotechnology 16 (2005), pp. 171-175.
-
(2005)
Nanotechnology
, vol.16
, pp. 171-175
-
-
Schift, H.1
Saxer, S.2
Park, S.3
Padeste, C.4
Pieles, U.5
Gobrecht, J.6
-
89
-
-
39549094678
-
Anti-sticking treatment for a nanoimprint stamp
-
Sun, H., Liu, J., Gu, P. and Chen, D. Anti-sticking treatment for a nanoimprint stamp. Applied Surface Science 254 (2008), pp. 2955-2959.
-
(2008)
Applied Surface Science
, vol.254
, pp. 2955-2959
-
-
Sun, H.1
Liu, J.2
Gu, P.3
Chen, D.4
-
90
-
-
33646069964
-
AFM characterization of anti-sticking layers used in nanoimprint
-
Tallal, J., Gordon, M., Berton, K., Charkey, A. L. and Peyrade, D. AFM characterization of anti-sticking layers used in nanoimprint. Microelectron. Eng. 83 (2006), pp. 851-854.
-
(2006)
Microelectron. Eng.
, vol.83
, pp. 851-854
-
-
Tallal, J.1
Gordon, M.2
Berton, K.3
Charkey, A.L.4
Peyrade, D.5
-
91
-
-
80054920780
-
-
http://www.setsas.fr.
-
-
-
-
92
-
-
80054932668
-
-
http://www.dowcorning.com.
-
-
-
-
93
-
-
0033262706
-
Large Scale Nanolithography using Nanoimprint Lithography
-
Heidari, B., Maximov, I., Sarwe, E.-L. and Montelius, L. Large Scale Nanolithography using Nanoimprint Lithography. J. Vac. Sci. Technol. B17 (1999), pp. 2961-2964.
-
(1999)
J. Vac. Sci. Technol.
, vol.B17
, pp. 2961-2964
-
-
Heidari, B.1
Maximov, I.2
Sarwe, E.-L.3
Montelius, L.4
-
94
-
-
0033130730
-
Nanoimprint lithography for large area pattern replication
-
Lebib, A., Bourneix, J., Carcenac, F., Cambril, E., Couraud, L. and Launois, H. Nanoimprint lithography for large area pattern replication. Microelectronic Eng. 46 (1999), pp. 319-322.
-
(1999)
Microelectronic Eng.
, vol.46
, pp. 319-322
-
-
Lebib, A.1
Bourneix, J.2
Carcenac, F.3
Cambril, E.4
Couraud, L.5
Launois, H.6
-
95
-
-
0000781784
-
Wafer-scale sub-micron lithography
-
Khang, D.-Y. and Lee, H.H. Wafer-scale sub-micron lithography. Applied Physics Letters vol. 75. No. 17 (1999), pp. 2599-2601. (Pubitemid 129564356)
-
(1999)
Applied Physics Letters
, vol.75
, Issue.17
, pp. 2599-2601
-
-
Khang, D.-Y.1
Lee, H.H.2
-
96
-
-
0034207492
-
Nanoreplication in polymers using hot embossing and injection molding
-
Schift, H., David, C., Gabriel, M., Gobrecht, J., Heyderman, L.J., Kaiser, W., Köppel, S. and Scandella, L. Nanoreplication in polymers using hot embossing and injection molding. Microelectronic Eng. 53 (2000), pp. 171-174.
-
(2000)
Microelectronic Eng.
, vol.53
, pp. 171-174
-
-
Schift, H.1
David, C.2
Gabriel, M.3
Gobrecht, J.4
Heyderman, L.J.5
Kaiser, W.6
Köppel, S.7
Scandella, L.8
-
97
-
-
80054947981
-
-
http://www.mrt.de.
-
-
-
-
98
-
-
22144449969
-
Advanced polymers and resists - A key to the development of nanoimprint lithography
-
DOI 10.2494/photopolymer.18.525
-
Reuther, F. Advanced Polymers and Resists - A Key to the Development of Nanoimprint Lithography. J. Photopolym. Sci. Technol. 18(4) (2005), pp. 525- 530. (Pubitemid 40976913)
-
(2005)
Journal of Photopolymer Science and Technology
, vol.18
, Issue.4
, pp. 525-530
-
-
Reuther, F.1
-
99
-
-
0000373843
-
Roller nanoimprint lithography
-
Tan, H., Gilbertson, A. and Chou, S.Y. Roller nanoimprint lithography. J. Vac. Sci. Technol. B16(6) (1998), pp. 3926-3928. (Pubitemid 128601046)
-
(1998)
Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
, vol.16
, Issue.6
, pp. 3926-3928
-
-
Tan, H.1
Gilbertson, A.2
Chou, S.Y.3
-
100
-
-
72749103360
-
-
Ph.D.t Thesis, VTT Publications
-
Mäkelä, T. Towards printed electronics devices. Ph.D. Thesis, VTT Publications 674 (2008). 61 p. + app. 28 p. http://www.vtt.fi/inf/pdf/ publications/2008/P674.pdf
-
(2008)
Towards printed electronics devices
, vol.674
-
-
Mäkelä, T.1
-
102
-
-
5344268855
-
Mold-assisted nanolithography: A process for reliable pattern replication
-
Haisma, J., Verheijen, M. and van den Heuvel, K. Mold-assisted lithography: A process for reliable pattern replication. J. Vac. Sci. Technol. B14(6) (1996), pp.4124-4128. (Pubitemid 126582845)
-
(1996)
Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
, vol.14
, Issue.6
, pp. 4124-4128
-
-
Haisma, J.1
Verheijen, M.2
Van Den Heuvel, K.3
Van Den Berg, J.4
-
103
-
-
0034205303
-
Fabrication of Nanostructures using UV-based imprint technique
-
Bender, M., Otto, M., Hadam, B., Vratzov, B., Spangenberg, B. and Kurz, H. Fabrication of Nanostructures using UV-based imprint technique. Microelectron. Eng. 53 (2000), pp. 233-236.
-
(2000)
Microelectron. Eng.
, vol.53
, pp. 233-236
-
-
Bender, M.1
Otto, M.2
Hadam, B.3
Vratzov, B.4
Spangenberg, B.5
Kurz, H.6
-
104
-
-
0942278341
-
Large scale UV based nanoimprint lithography
-
Vratzov, B., Fuchs, A., Lemme, M., Henschel, W. and Kurz, H. Large scale UV based nanoimprint lithography. J. Vac. Sci. Technol. B 21(6) (2003), p. 2760.
-
(2003)
J. Vac. Sci. Technol. B
, vol.21
, Issue.6
, pp. 2760
-
-
Vratzov, B.1
Fuchs, A.2
Lemme, M.3
Henschel, W.4
Kurz, H.5
-
105
-
-
0035450409
-
Characterization and application of a UV-based imprint technique
-
PII S0167931701005366
-
Otto, M., Bender, M., Hadam, B., Spangenberg, B. and Kurz, H. Characterization and application of UV-based imprint technique. Microelectron. Eng. 57-58 (2001), pp. 361-366. (Pubitemid 32798210)
-
(2001)
Microelectronic Engineering
, vol.57-58
, pp. 361-366
-
-
Otto, M.1
Bender, M.2
Hadam, B.3
Spangenberg, B.4
Kurz, H.5
-
106
-
-
14944343758
-
Wafer scale patterning by soft UV-Nanoimprint Lithography
-
Plachetka, U., Bender, M., Fuchs, A., Vratsov, B., Glinsner, T., Lindner, F. and Kurz, H. Wafer scale patterning by soft UV-Nanoimprint Lithography. Microelectron. Eng. 73-74 (2004), pp. 167-171.
-
(2004)
Microelectron. Eng.
, vol.73-74
, pp. 167-171
-
-
Plachetka, U.1
Bender, M.2
Fuchs, A.3
Vratsov, B.4
Glinsner, T.5
Lindner, F.6
Kurz, H.7
-
107
-
-
0035519809
-
Step and flash imprint lithography: Defect analysis
-
DOI 10.1116/1.1420203, 45th International COnference on Electron, Ion, and Photon Beam Technology and Nanofabrication
-
Bailey, T., Smith, B., Choi, B.J., Colburn, M., Meissl, M., Sreenivasan, S.V., Ekerdt, J.G. and Willson, C.G. Step and flash imprint lithography: Defect analysis. J. Vac. Sci. Technol. B19(6) (2001), pp. 2806-2810. (Pubitemid 34089832)
-
(2001)
Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
, vol.19
, Issue.6
, pp. 2806-2810
-
-
Bailey, T.1
Smith, B.2
Choi, B.J.3
Colburn, M.4
Meissl, M.5
Sreenivasan, S.V.6
Ekerdt, J.G.7
Willson, C.G.8
-
108
-
-
12444274893
-
Step&flash imprint lithography
-
Resnick, D.J., Sreenivasan, S.V. and Wilson, C.G. Step&flash imprint lithography. Mater. Today 8(2) (2005), pp. 34-42.
-
(2005)
Mater. Today
, vol.8
, Issue.2
, pp. 34-42
-
-
Resnick, D.J.1
Sreenivasan, S.V.2
Wilson, C.G.3
-
109
-
-
33646024012
-
Status and prospects of UVNanoimprinting technology
-
Bender, M., Fuchs, A., Plachetka, U. and Kurz, H. Status and prospects of UVNanoimprinting technology. Microelectron. Eng. 83 (2006), pp. 827-830.
-
(2006)
Microelectron. Eng.
, vol.83
, pp. 827-830
-
-
Bender, M.1
Fuchs, A.2
Plachetka, U.3
Kurz, H.4
-
110
-
-
47349111098
-
Lithography potentials of UV-nanoimprint
-
Fuchs, A., Bender, M., Plachetka, U., Kock, L., Koo, N., Wahlbrink, T. and Kurz, H. Lithography potentials of UV-nanoimprint. Current Apl. Phys. 8 (2008), pp. 669-674.
-
(2008)
Current Apl. Phys.
, vol.8
, pp. 669-674
-
-
Fuchs, A.1
Bender, M.2
Plachetka, U.3
Kock, L.4
Koo, N.5
Wahlbrink, T.6
Kurz, H.7
-
111
-
-
34249896148
-
UV nanoimprint materials: Surface energies, residual layers, and imprint quality
-
DOI 10.1116/1.2732742
-
Schmitt, H., Frey, L., Ryssel, H., Rommel, M. and Lehrer, C.K. UV nanoimprint materials: Surface energies, residual layers, and imprint quality. J. Vac. Sci. Technol. B25(3) (2007), pp. 785-790. (Pubitemid 46872366)
-
(2007)
Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
, vol.25
, Issue.3
, pp. 785-790
-
-
Schmitt, H.1
Frey, L.2
Ryssel, H.3
Rommel, M.4
Lehrer, C.5
-
112
-
-
34247589260
-
Fluorinated materials for UV nanoimprint lithography
-
DOI 10.1016/j.mee.2007.01.135, PII S0167931707000767, Proceedings of the 32nd International Conference on Micro- and Nano-Engineering
-
Kawaguchi, Y., Nonaka, F. and Sanada, Y. Fluorinated materials for UV nanoimprint lithography. Microelectron. Eng. 84 (2007), pp. 973-976. (Pubitemid 46680541)
-
(2007)
Microelectronic Engineering
, vol.84
, Issue.5-8
, pp. 973-976
-
-
Kawaguchi, Y.1
Nonaka, F.2
Sanada, Y.3
-
113
-
-
34247617296
-
Template replication for full wafer imprint lithography
-
DOI 10.1016/j.mee.2007.01.060, PII S016793170700055X, Proceedings of the 32nd International Conference on Micro- and Nano-Engineering
-
Miller, M., Schmid, G., Doyle, G., Thompson, E. and Resnick, D.J. Template replication for full wafer imprint lithography. Microelectron. Eng. 84 (2007), pp. 885-890. (Pubitemid 46678309)
-
(2007)
Microelectronic Engineering
, vol.84
, Issue.5-8
, pp. 885-890
-
-
Miller, M.1
Schmid, G.2
Doyle, G.3
Thompson, E.4
Resnick, D.J.5
-
114
-
-
59049099165
-
UV nanoimprint using flexible polymer template and substrate
-
Hong, S.-H., Hwang, J.-Y., Lee, H., Lee, H.-C. and Choi, K.-W. UV nanoimprint using flexible polymer template and substrate. Microelectron. Eng. 86 (2009), pp. 295-298.
-
(2009)
Microelectron. Eng.
, vol.86
, pp. 295-298
-
-
Hong, S.-H.1
Hwang, J.-Y.2
Lee, H.3
Lee, H.-C.4
Choi, K.-W.5
-
115
-
-
67349122619
-
Stamp replication for thermal and UV nanoimprint lithography using a UV-sensitive silsesquioxane resist
-
Kehagias, N., Reboud, V., De Girolamo, J., Chouiki, M., Zelsmann, M., Boussey, J. and Sotomayor Torres, C.M. Stamp replication for thermal and UV nanoimprint lithography using a UV-sensitive silsesquioxane resist. Microelectron.Eng. 86 (2009), pp. 776-778.
-
(2009)
Microelectron.Eng.
, vol.86
, pp. 776-778
-
-
Kehagias, N.1
Reboud, V.2
De Girolamo, J.3
Chouiki, M.4
Zelsmann, M.5
Boussey, J.6
Sotomayor Torres, C.M.7
-
116
-
-
67349232285
-
Novel transparent hybrid polymer working stamp for UV-imprinting
-
Klukowska, A., Kolander, A., Bergmair, I., Muhlberger, M., Leichtfried, H., Reuther, F., Grutzner, G. and Schöfner, R. Novel transparent hybrid polymer working stamp for UV-imprinting. Microelectron. Eng. 86 (2009), pp. 697-699.
-
(2009)
Microelectron. Eng.
, vol.86
, pp. 697-699
-
-
Klukowska, A.1
Kolander, A.2
Bergmair, I.3
Muhlberger, M.4
Leichtfried, H.5
Reuther, F.6
Grutzner, G.7
Schöfner, R.8
-
117
-
-
4243591197
-
Template fabrication schemes for step and flash imprint lithography
-
DOI 10.1016/S0167-9317(02)00462-8, PII S0167931702004628
-
Bailey, T.C., Resnick, D.J., Mancini, D., Nordquist, K.J., Dauksher, W.J., Ainley, E., Talin. A., Gehoski K., Baker, J.H., Choi, B. J., Johnson, S., Colburn, M., Meissl, M., Sreenivasan, S.V., Ekerdt, J. G. and Willson, C.G. Template fabricationn schemes for step and flash imprint lithography. Microelectron. Eng. 61-62 (2002), pp. 461-467. (Pubitemid 34613402)
-
(2002)
Microelectronic Engineering
, vol.61-62
, pp. 461-467
-
-
Bailey, T.C.1
Resnick, D.J.2
Mancini, D.3
Nordquist, K.J.4
Dauksher, W.J.5
Ainley, E.6
Talin, A.7
Gehoski, K.8
Baker, J.H.9
Choi, B.J.10
Johnson, S.11
Colburn, M.12
Meissl, M.13
Sreenivasan, S.V.14
Ekerdt, J.G.15
Willson, C.G.16
|