Fabrication of Si-based nanoimprint stamps with sub-20 nm features

Microelectronic Engineering

Volumn 61-62, Issue , 2002, Pages 449-454

  Maximov, Ivan ^a   Sarwe, E L ^a   Beck, M ^a   Deppert, K ^a   Graczyk, M ^a   Magnusson, M H ^a   Montelius, L ^a  

^a LUND UNIVERSITY   (Sweden)

Author keywords

Aerosols; Electron beam lithography; Etching; Nanoimprint

Indexed keywords

AEROSOLS; CHROMIUM; ELECTRODEPOSITION; INTEGRATED CIRCUIT MANUFACTURE; MASKS; NANOTECHNOLOGY; OPTIMIZATION; PHOTORESISTS; REACTIVE ION ETCHING; SEMICONDUCTING SILICON; SILICA;

ETCH GASES; NANOIMPRINT STAMPS;

ELECTRON BEAM LITHOGRAPHY;

EID: 0036643783     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(02)00488-4     Document Type: Conference Paper

References (7)

1. VLSI electronics microstructure science