Residual layer thickness in nanoimprint: Experiments and coarse-grain simulation

Microelectronic Engineering

Volumn 85, Issue 5-6, 2008, Pages 846-849

  Kehagias, Nikolaos ^a   Reboud, Vincent ^a   Sotomayor Torres, Clivia M ^a,b,c   Sirotkin, Vadim ^d   Svintsov, Alexander ^d   Zaitsev, Sergey ^d  

^a UNIVERSITY COLLEGE CORK   (Ireland)

^b CATALAN INSTITUTE OF NANOSCIENCE AND NANOTECHNOLOGY ICN2   (Spain)

^c INSTITUCIÓ CATALANA DE RECERCA I ESTUDIS AVANÇATS ICREA   (Spain)

^d INSTITUTE OF MICROELECTRONICS TECHNOLOGY AND HIGH PURITY MATERIALS   (Russian Federation)

Author keywords

Computer simulation; Nanoimprint lithography; Stamp and substrate deformation

Indexed keywords

COARSENING; COMPUTER SIMULATION;

COARSE-GRAIN METHOD; SUBSTRATE DEFORMATION;

NANOIMPRINT LITHOGRAPHY;

FINENESS; LITHOGRAPHY; SIMULATION;

EID: 44149124095     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2007.12.041     Document Type: Article

References (6)

1. Schift H., and Heyderman L.J. In: Sotomayor Torres C.M. (Ed). Alternative Lithography (Series: Nanostructure Science and Technology) (2003), Kluwer Academic/Plenum Publishers, New York (Chapter 4)
2. Guo L.J. J. Phys. D: Appl. Phys. 37 (2004) R123
3. Sirotkin V., Svintsov A., Schift H., and Zaitsev S. Microelectron. Eng. 84 (2007) 868
4. Sirotkin V., Svintsov A., Zaitsev S., and Schift H. J. Vac. Sci. Technol. B 25 (2007) 2379
5. NaPa project, Integrated Project, EU 6th frame program, Web-page , 2005 (accessed 01.10.05).
6. Micro Resist Technology GmbH. Product Information - Thermoplastic Polymers for Nanoimprint Lithography mr-I 7000, mr-I 8000 and mr-I PMMA - Special Polymers for NIL, web page http://www.microresist.de/thermoplastics_2005_en.htm.