A non-destructive method for the removal of residual resist in imprinted patterns

Microelectronic Engineering

Volumn 67-68, Issue , 2003, Pages 245-251

  Chen, Y ^a   Macintyre, D S ^a   Thoms, S ^a  

^a UNIVERSITY OF GLASGOW   (United Kingdom)

Author keywords

Lithography; Nanoimprint; Non destructive; Residual resist

Indexed keywords

DISSOLUTION; DRY ETCHING; NONDESTRUCTIVE EXAMINATION;

RESIDUAL RESIST;

LITHOGRAPHY;

EID: 0038359116     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(03)00184-9     Document Type: Conference Paper

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