Controlled co-evaporation of silanes for nanoimprint stamps

Nanotechnology

Volumn 16, Issue 5, 2005, Pages

  Schift, Helmut ^a   Saxer, Sina ^a   Park, Sunggook ^a,c   Padeste, Celestino ^a   Pieles, Uwe ^b   Gobrecht, Jens ^a  

^a PAUL SCHERRER INSTITUTE   (Switzerland)

^b UNIVERSITY OF APPLIED SCIENCES AND ARTS NORTHWESTERN SWITZERLAND   (Switzerland)

^c Louisiana State University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CONTACT ANGLE; EVAPORATION; NANOTECHNOLOGY; SILANES;

ANTI-ADHESIVE COATINGS; NANOIMPRINT LITHOGRAPHY; NANOIMPRINT STAMPS; WATER CONTENT;

COATINGS;

EID: 24144476257     PISSN: 09574484     EISSN: None     Source Type: Journal    
DOI: 10.1088/0957-4484/16/5/007     Document Type: Conference Paper

References (9)

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