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Volumn 57-58, Issue , 2001, Pages 367-373

Low temperature nanoimprint lithography using silicon nitride molds

Author keywords

Imprint profile; Low temperature imprint; Nanoimprint lithography; Reactive ion etching; Silicon nitride molds

Indexed keywords

CHEMICAL VAPOR DEPOSITION; LOW TEMPERATURE OPERATIONS; MOLDS; QUENCHING; REACTIVE ION ETCHING; SILICON NITRIDE; SUBSTRATES; SURFACE ACTIVE AGENTS;

EID: 0035450318     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(01)00435-X     Document Type: Conference Paper
Times cited : (32)

References (6)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.