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Volumn 57-58, Issue , 2001, Pages 367-373
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Low temperature nanoimprint lithography using silicon nitride molds
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Author keywords
Imprint profile; Low temperature imprint; Nanoimprint lithography; Reactive ion etching; Silicon nitride molds
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Indexed keywords
CHEMICAL VAPOR DEPOSITION;
LOW TEMPERATURE OPERATIONS;
MOLDS;
QUENCHING;
REACTIVE ION ETCHING;
SILICON NITRIDE;
SUBSTRATES;
SURFACE ACTIVE AGENTS;
NANOIMPRINT LITHOGRAPHY;
NANOTECHNOLOGY;
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EID: 0035450318
PISSN: 01679317
EISSN: None
Source Type: Journal
DOI: 10.1016/S0167-9317(01)00435-X Document Type: Conference Paper |
Times cited : (32)
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References (6)
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