Analysis of the nanoimprint lithography with a viscous model

Microelectronic Engineering

Volumn 77, Issue 3-4, 2005, Pages 405-411

  Young, Wen Bin ^a  

^a NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

Author keywords

Hot embossing; Modeling; Nano scale patterns; Nanoimprint lithography

Indexed keywords

COMPUTER AIDED ENGINEERING; COMPUTER SIMULATION; DEFORMATION; POLYMERS; PRESSURE EFFECTS; SUBSTRATES; THERMAL EFFECTS; VISCOSITY;

HOT EMBOSSING; MODELING; NANO SCALE PATTERNS; NANOIMPRINT LITHOGRAPHY;

LITHOGRAPHY;

EID: 15344346362     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2005.01.024     Document Type: Article

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