Fabrication of a silicon oxide stamp by edge lithography reinforced with silicon nitride for nanoimprint lithography

Journal of Micromechanics and Microengineering

Volumn 18, Issue 6, 2008, Pages

  Zhao, Yiping ^a   Berenschot, Erwin ^a   De Boer, Meint ^a   Jansen, Henri ^a   Tas, Niels ^a   Huskens, Jurriaan ^a   Elwenspoek, Miko ^a  

^a UNIVERSITY OF TWENTE   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

FABRICATION; NANOIMPRINT LITHOGRAPHY; NITRIDES; NONMETALS; PHOTOLITHOGRAPHY; POLYMERS; SEMICONDUCTING SILICON COMPOUNDS; SILICA; SILICON COMPOUNDS; SILICON NITRIDE;

EDGE LITHOGRAPHIES; FABRICATION PROCESSES; OPTICAL LITHOGRAPHIES; SILICON OXIDES; SILICON RICH NITRIDES; WET ANISOTROPIC ETCHINGS;

SILICON WAFERS;

EID: 57249090773     PISSN: 09601317     EISSN: 13616439     Source Type: Journal    
DOI: 10.1088/0960-1317/18/6/064013     Document Type: Conference Paper

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