Fabrication of nanostructures using a UV-based imprint technique

Microelectronic Engineering

Volumn 53, Issue 1, 2000, Pages 233-236

  Bender, M ^a   Otto, M ^a   Hadam, B ^a   Vratzov, B ^a,b   Spangenberg, B ^a   Kurz, H ^a  

^a UNIVERSITY HOSPITAL RWTH AACHEN   (Germany)

^b AMO GMBH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ETCHING; NANOSTRUCTURED MATERIALS; PHOTOLITHOGRAPHY; PHOTOPOLYMERIZATION; SEMICONDUCTOR QUANTUM DOTS; ULTRAVIOLET RADIATION;

QUARTZ MOLD; ULTRAVIOLET BASED IMPRINT TECHNIQUE;

MICROELECTRONIC PROCESSING;

EID: 0034205303     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(00)00304-X     Document Type: Article

References (3)

1. 1 S. Y. Chou, P. R. Krauss and P. J. Rennstrom, J. Vac. Sci. Technol. B, Vol. 14, pp. 4129-4133, 1996 and Appl. Phys. Lett. Vol. 67, pp. 3114-3117, 1997.
2. 1 S. Y. Chou, P. R. Krauss and P. J. Rennstrom, J. Vac. Sci. Technol. B, Vol. 14, pp. 4129-4133, 1996 and Appl. Phys. Lett. Vol. 67, pp. 3114-3117, 1997.
3. 2 S. Y. Chou, P. Krauss, W. Zhang, L. Guo and L. Zhuang, J. Vac. Sci. Technol. B, Vol. 15, pp. 2897-2904, 1997.