Impact of molecular weight of polymers and shear rate effects for nanoimprint lithography

Microelectronic Engineering

Volumn 83, Issue 2, 2006, Pages 259-280

  Schulz, H ^a,b   Wissen, M ^a   Bogdanski, N ^a   Scheer, H C ^a   Mattes, K ^a,c   Friedrich, Ch ^a,c  

^a UNIVERSITY OF WUPPERTAL   (Germany)

^b CARL ZEISS SMT AG   (Germany)

^c UNIVERSITY OF FREIBURG   (Germany)

Author keywords

Hot embossing lithography; Polystyrene; Residual layer height and uniformity; Shear thinning; Thermal nanoimprint; Viscosity

Indexed keywords

CAVITATION; LITHOGRAPHY; MOLECULAR WEIGHT; PARAMETER ESTIMATION; POLYSTYRENES; SHEAR DEFORMATION; VISCOMETERS; VISCOSITY;

HOT EMBOSSING LITHOGRAPHY; RESIDUAL LAYER HEIGHT AND UNIFORMITY; SHEAR THINNING; THERMAL NANOIMPRINT;

POLYMERS;

EID: 32044442937     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2005.07.090     Document Type: Review

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