Fabrication of silicon micro-mould for polymer replication using focused ion beam

Microelectronic Engineering

Volumn 86, Issue 4-6, 2009, Pages 556-560

  Kim, C S ^a   Park, J ^b   Chu, W S ^a   Jang, D Y ^b   Kim, S D ^b   Ahn, S H ^c  

^a Seoul National University   (South Korea)

^b Seoul National University of Science and Technology   (South Korea)

^c Seoul National University   (South Korea)

Author keywords

Continuous slicing method; Focused ion beam sputtering; Microscale mould; Polymer replication; Spiral scan

Indexed keywords

CONTINUOUS SLICING METHOD; FOCUSED ION BEAM SPUTTERING; MICROSCALE MOULD; POLYMER REPLICATION; SPIRAL SCAN;

BEAM PLASMA INTERACTIONS; FABRICATION; FOCUSED ION BEAMS; ION BOMBARDMENT; IONS; POLYMERS; SILICONES; SPUTTERING;

MOLDS;

EID: 67349143725     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2008.12.081     Document Type: Article

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