Step and flash imprint lithography: Defect analysis

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 19, Issue 6, 2001, Pages 2806-2810

  Bailey, T ^a   Smith, B ^a   Choi, B J ^a   Colburn, M ^a   Meissl, M ^a   Sreenivasan, S V ^a   Ekerdt, J G ^a   Willson, C G ^a  

^a The University of Texas at Austin   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL DEFECTS; IMPURITIES; INSPECTION; PARTICLES (PARTICULATE MATTER); PRINTING; SILICON WAFERS; SURFACE TREATMENT;

CONTACT PRINTING TECHNIQUE; EFFECT OF DEFECT PROPAGATION; IMPRINTING; STEP AND FLASH IMPRINT LITHOGRAPHY; TEMPLATE;

PHOTOLITHOGRAPHY;

EID: 0035519809     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1420203     Document Type: Article

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