Hot embossing in polymers as a direct way to pattern resist

Microelectronic Engineering

Volumn 41-42, Issue , 1998, Pages 575-578

  Jaszewski, R W ^a   Schift, H ^a   Gobrecht, J ^a   Smith, P ^b  

^a PAUL SCHERRER INSTITUTE   (Switzerland)

^b ETH ZURICH   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; LITHOGRAPHY; PHOTORESISTS; POLYMERS; SCANNING ELECTRON MICROSCOPY;

HOT EMBOSSING;

NANOTECHNOLOGY;

EID: 0031685664     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(98)00135-X     Document Type: Article

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