Large scale ultraviolet-based nanoimprint lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 21, Issue 6, 2003, Pages 2760-2764

  Vratzov, B ^a   Fuchs, A ^a   Lemme, M ^a   Henschel, W ^a   Kurz, H ^a  

^a AMO GMBH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CURING; MOS DEVICES; NANOSTRUCTURED MATERIALS; OPTICAL RESOLVING POWER; REACTIVE ION ETCHING; SCANNING ELECTRON MICROSCOPY; SILICON ON INSULATOR TECHNOLOGY; SILICON WAFERS; SPIN COATING; SURFACE ROUGHNESS; ULTRAVIOLET RADIATION;

NANOIMPRINT LITHOGRAPHY (NIL); ROOT MEAN SQUARE (RMS);

ELECTRON BEAM LITHOGRAPHY;

EID: 0942278341     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.162781610.1116/1.1627816     Document Type: Article

References (6)

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