Structure size dependent recovery of thin polystyrene layers in thermal imprint lithography

Microelectronic Engineering

Volumn 84, Issue 5-8, 2007, Pages 860-863

  Bogdanski, Nicolas ^a   Wissen, Matthias ^a   Möllenbeck, Saskia ^a   Scheer, Hella Christin ^a  

^a UNIVERSITY OF WUPPERTAL   (Germany)

Author keywords

Hot embossing; Lift off; Nanoimprint; Recovery; Thin residual layer

Indexed keywords

CRYSTAL STRUCTURE; NANOIMPRINT LITHOGRAPHY; POLYMER BLENDS;

LIFT-OFF; THIN RESIDUAL LAYER;

POLYSTYRENES;

CRYSTAL STRUCTURE; EMBOSSING; HOT FORMING; POLYSTYRENE;

EID: 34247591461     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2007.01.093     Document Type: Article

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