Flow behaviour of thin polymer films used for hot embossing lithography

Microelectronic Engineering

Volumn 54, Issue 3-4, 2000, Pages 229-245

  Heyderman, L J ^a   Schift, H ^a   David, C ^a   Gobrecht, J ^a   Schweizer, T ^b  

^a PAUL SCHERRER INSTITUTE   (Switzerland)

^b ETH ZURICH   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; MICROSTRUCTURE; NANOSTRUCTURED MATERIALS; NANOTECHNOLOGY; PLASTIC DEFORMATION; PLASTICS MOLDING; POLYMETHYL METHACRYLATES; THIN FILMS; VISCOSITY; VISCOUS FLOW;

HOT EMBOSSING;

PLASTIC FILMS;

EID: 0034508819     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(00)00414-7     Document Type: Article

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