Embossing of nanoscale features and environments

Microelectronic Engineering

Volumn 35, Issue 1-4, 1997, Pages 393-396

  Casey, B G ^a   Monaghan, W ^a   Wilkinson, C D W ^a  

^a UNIVERSITY OF GLASGOW   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

CELLULOSE DERIVATIVES; DRY ETCHING; ELECTRON BEAM LITHOGRAPHY; ELECTROPLATING; FABRICATION; PHOTOLITHOGRAPHY; PLASTICS APPLICATIONS; THERMOPLASTICS;

PLASTIC CELLULOSE ACETATE; PLASTIC DEVICES; POLYMER CELLULOSE ACETATE;

NANOTECHNOLOGY;

EID: 0031074741     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(96)00208-0     Document Type: Article

References (6)

1. S.Y. Chou, P.R. Krauss, P.J. Renstrom, Science, 272, 5258 (1996)
2. D. Macintyre, S. Thoms, Microelectronic Engineering 30 (1996) 327-330.
3. A. Midha, S.K. Murad, J.M.R. Weaver, Anisotropic Pattern Transfer of Fine Resist Features to Silicon Nitride Via an Intermediate Titanium Layer, to be published Microelectronic Engineering (1997).
4. J.A. Bryson, Plastics Materials, Chapel River Press Ltd, Uk 1969.
5. S.F. Steeneken, A.G.J. Buma, W.C. Gieskes, Photochemistry and Photobiology, 1995, 61, 276-280.
6. R. Ranby, J.F. Rabek, Photodegredation, Photooxidation and Photostabilization of Polymers, John Wiley and Sons Ltd, UK 1975.