Imprint lithography with sub-10 nm feature size and high throughput

Microelectronic Engineering

Volumn 35, Issue 1-4, 1997, Pages 237-240

  Chou, Stephen Y ^a   Krauss, Peter R ^a  

^a UNIVERSITY OF MINNESOTA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

FABRICATION; FILMS; PHOTODETECTORS; REACTIVE ION ETCHING; SEMICONDUCTOR QUANTUM DOTS; SEMICONDUCTOR QUANTUM WIRES; TRANSISTORS;

NANOIMPRINT TECHNOLOGY; PATTERN TRANSFER;

NANOTECHNOLOGY;

EID: 0031074686     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(96)00097-4     Document Type: Article

References (14)

1. A. N. Broers, J. M. Harper, W. W. Molzen, Appl. Phys. Lett. 33, 392 (1978).
2. D. Flanders, Appl. Phys. Lett. 36, 93 (1980).
3. K. Early, M. L. Schattenburg, H. I. Smith, Microelectronic Engineering 11, 317 (1990).
4. M. A. McCord, R. F. P. Pease, J. Vac. Sci. Technol. B4, 86 (1986).
5. J. W. Lyding, et. al, App. Phys. Lett. 64, 2010 (1994).
6. T. R. Albrecht, et. al., J. of Appl. Phys. 64(3), 1178 (1988).
7. S. Y. Chou, P. R. Krauss, and P. J. Renstrom, Appl. Phys. Lett. 67(21), 3114 (1995); P. R. Krauss and S. Y. Chou, 39th EIPB, Scottsdale, AZ, May 30 - June 2, 1995; J. Vac. Sci. Technol. B 13(6) 2850 (1995).
8. S. Y. Chou, P. R. Krauss, and P. J. Renstrom, Appl. Phys. Lett. 67(21), 3114 (1995); P. R. Krauss and S. Y. Chou, 39th EIPB, Scottsdale, AZ, May 30 - June 2, 1995; J. Vac. Sci. Technol. B 13(6) 2850 (1995).
9. S. Y. Chou, P. R. Krauss, and P. J. Renstrom, Appl. Phys. Lett. 67(21), 3114 (1995); P. R. Krauss and S. Y. Chou, 39th EIPB, Scottsdale, AZ, May 30 - June 2, 1995; J. Vac. Sci. Technol. B 13(6) 2850 (1995).
10. A. Kumar and G. M. Whitesides, Appl. Phys. Lett. 63(14), 2002 (1993).
11. I. Rubin, Injection Molding, (Wiley, New York) 1972.
12. S. Y. Chou, P. R. Krauss, and P. J. Renstrom, 40th EIPB, Atlanta, GA, May 28-31, 1996.
13. P. R. Krauss and S. Y. Chou, submitted to Science, 1996.
14. L. J. Guo, P. R. Krauss, and S. Y. Chou, submitted to Appl. Phys. Lett., 1996.