Nanoimprint lithography for a large area pattern replication

Microelectronic Engineering

Volumn 46, Issue 1, 1999, Pages 319-322

  Lebib, A ^a   Chen, Y ^a   Bourneix, J ^a   Carcenac, F ^a   Cambril, E ^a   Couraud, L ^a   Launois, H ^a  

^a CNRS   (France)

Author keywords

[No Author keywords available]

Indexed keywords

SILICON WAFERS;

LARGE AREA PATTERNING;

NANOTECHNOLOGY;

EID: 0033130730     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(99)00094-5     Document Type: Article

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