Mold deformation in nanoimprint lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 22, Issue 6, 2004, Pages 3318-3322

  Lazzarino, F ^a   Gourgon, C ^a   Schiavone, P ^a   Perret, C ^a  

^a CEA GRENOBLE   (France)

Author keywords

[No Author keywords available]

Indexed keywords

DEFORMATION; GLASS TRANSITION; PLASMA ETCHING; POISSON DISTRIBUTION; PRINTING; STRESS ANALYSIS; SUPERCONDUCTING TRANSITION TEMPERATURE; VISCOELASTICITY;

MOLD DEFORMATION; MOLD PATTERN; NANOIMPRINT LITHOGRAPHY (NIL); POLYMER SURFACE;

ELECTRON BEAM LITHOGRAPHY;

EID: 13244283408     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1815299     Document Type: Conference Paper

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