Large scale nanolithography using nanoimprint lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 17, Issue 6, 1999, Pages 2961-2964

  Heidari, Babak ^a   Maximov, Ivan ^a   Sarwe, Eva Lena ^a   Montelius, Lars ^a  

^a LUND UNIVERSITY   (Sweden)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0033262706     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.590934     Document Type: Article

References (5)

1. S. Y. Chou, P. R. Krauss, and P. J. Renstorm, Appl. Phys. Lett. 67, 3114 (1995).
2. S. Y. Chou, P. R. Krauss, W. Zhang, L. Guo, and L. Zhuang, J. Vac. Sci. Technol. B 15, 2897 (1997).
3. S. Y. Chou, P. R. Krauss, and P. J. Renstorm, J. Vac. Sci. Technol. B 14, 4129 (1996).
4. K. Pfeiffer, G. Bleidiessel, G. Gruetzner, H. Schulz, T. Hoffmann, H.-C. Scheer, C. M. Sotomayor Torres, and J. Ahopelto, Proceedings of the Micro and Nano Engineering Conference, 1998, Leuven.
5. B. Cui, W. Wu, L. Kong, X. Sun, and S. Y. Chou, J. Appl. Phys. 85, 5534 (1999).