Advanced polymers and resists - A key to the development of nanoimprint lithography

Journal of Photopolymer Science and Technology

Volumn 18, Issue 4, 2005, Pages 525-530

  Reuther, Freimut ^a  

^a MICRO RESIST TECHNOLOGY GMBH   (Germany)

Author keywords

Curing polymers; Low imprint temperature; Nanoimprint lithography; Polymers; Thermoplastics

Indexed keywords

EID: 22144449969     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.18.525     Document Type: Article

References (6)

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