Template fabrication schemes for step and flash imprint lithography

Microelectronic Engineering

Volumn 61-62, Issue , 2002, Pages 461-467

  Bailey, T C ^a   Resnick, D J ^b   Mancini, D ^a   Nordquist, K J ^b   Dauksher, W J ^b   Ainley, E ^b   Talin, A ^b   Gehoski, K ^b   Baker, J H ^b   Choi, B J ^b   Johnson, S ^a   Colburn, M ^a   Meissl, M ^a   Sreenivasan, S V ^a   Ekerdt, J G ^a   Willson, C G ^a  

^a The University of Texas at Austin   (United States)

^b MOTOROLA INC   (United States)

Author keywords

Electron beam lithography; Imprint lithography; Nanolithography; Nanotechnology

Indexed keywords

CONDUCTIVE FILMS; ELECTROSTATIC PRINTING; FEATURE EXTRACTION; MASKS; NANOTECHNOLOGY; PATTERN RECOGNITION; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING INDIUM COMPOUNDS; TRANSPARENCY; ULTRAVIOLET RADIATION;

STEP AND FLASH IMPRINT LITHOGRAPHY (SFIL);

ELECTRON BEAM LITHOGRAPHY;

EID: 4243591197     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(02)00462-8     Document Type: Conference Paper

References (8)

1. Design of orientation stages for step and flash imprint lithography