Status and prospects of UV-Nanoimprint technology

Microelectronic Engineering

Volumn 83, Issue 4-9 SPEC. ISS., 2006, Pages 827-830

  Bender, M ^a   Fuchs, A ^a   Plachetka, U ^a   Kurz, H ^a  

^a AMO GMBH   (Germany)

Author keywords

Alignment; Lithography; Nanotechnology; Resist; Resolution; Spin coating; UV Nanoimprint; Wafer scale

Indexed keywords

ALIGNMENT; DATA ACQUISITION; LITHOGRAPHY; OPTICAL RESOLVING POWER; SEMICONDUCTOR MATERIALS; ULTRAVIOLET RADIATION;

RESIST; SPIN-COATING; UV-NANOIMPRINT; WAFER SCALE;

NANOTECHNOLOGY;

EID: 33646024012     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2006.01.220     Document Type: Article

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