Thermal imprint with negligibly low residual layer

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 24, Issue 6, 2006, Pages 2998-3001

  Bogdanski, Nicolas ^a   Wissen, Matthias ^a   Möllenbeck, Saskia ^a   Scheer, Hella Christin ^a  

^a UNIVERSITY OF WUPPERTAL   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL DEFECTS; DRY ETCHING; LITHOGRAPHY; SELF ASSEMBLY; THERMAL EFFECTS;

IMPRINTED STRUCTURES; LAYER THICKNESSES; POLYMER LAYERS;

POLYMERS;

EID: 33845258760     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2388964     Document Type: Article

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