Ion beam lithography by using highly charged ion beam of Ar

Colloids and Surfaces A: Physicochemical and Engineering Aspects

Volumn 313-314, Issue , 2008, Pages 407-410

  Iwamitsu, Shingo ^a   Nagao, Mamoru ^a   Pahlovy, Shahjada A ^a   Nishimura, Kohei ^a   Kashihara, Masaki ^a   Momota, Sadao ^a   Nojiri, Yoichi ^a   Taniguchi, Jun ^b   Miyamoto, Iwao ^b   Nakao, Takaaki ^b   Morita, Noboru ^c   Kawasegi, Noritaka ^d  

^a KOCHI UNIVERSITY OF TECHNOLOGY   (Japan)

^b TOKYO UNIVERSITY OF SCIENCE   (Japan)

^c UNIVERSITY OF TOYAMA   (Japan)

^d TOYAMA INDUSTRIAL TECHNOLOGY CENTER   (Japan)

Author keywords

Highly charged ion; Ion beam lithography; Nano fabrication

Indexed keywords

ETCHING; FABRICATION; NANOTECHNOLOGY;

HIGHLY CHARGED ION BEAMS; IRRADIATED MATERIALS; SINGLY CHARGED ION BEAMS;

ION BEAM LITHOGRAPHY;

ARGON; NANOMATERIAL;

ARTICLE; ION BEAM LITHOGRAPHY; IRRADIATION; MATERIALS TESTING; NANOFABRICATION; NANOTECHNOLOGY; PRIORITY JOURNAL; PRODUCTIVITY; RADIATION BEAM;

ETCHING; LITHOGRAPHY;

EID: 37349124570     PISSN: 09277757     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.colsurfa.2007.04.121     Document Type: Article

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