Electron beam lithography: Resolution limits and applications

Applied Surface Science

Volumn 164, Issue 1-4, 2000, Pages 111-117

  Vieu, C ^a,b   Carcenac, F ^a   Pepin A ^a   Chen, Y ^a   Mejias, M ^a   Lebib, A ^a   Manin Ferlazzo, L ^a   Couraud, L ^a   Launois, H ^a  

^a Lab Microstructures Microlectron   (France)

^b Lab d'Automat et d'Anal des Syst   (France)

Author keywords

Data storage devices; Electron beam lithography; Molecular electronics; Nanofabrication; Nanolithography; Single electron devices

Indexed keywords

EID: 0034273974     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(00)00352-4     Document Type: Article

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