Local mass transport and its effect on global pattern replication during hot embossing

Microelectronic Engineering

Volumn 67-68, Issue , 2003, Pages 657-663

  Schulz, H ^a   Wissen, M ^a   Scheer, H C ^a  

^a UNIVERSITY OF WUPPERTAL   (Germany)

Author keywords

Hot embossing lithography; Nanoimprint; Non uniformity; Polystyrene; Stamp layout

Indexed keywords

FLOW PATTERNS; LITHOGRAPHY; MASS TRANSFER; NEWTONIAN FLOW; NEWTONIAN LIQUIDS; POLYSTYRENES; VISCOSITY;

HOT EMBOSSING LITHOGRAPHY;

NANOTECHNOLOGY;

EID: 0037682242     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(03)00128-X     Document Type: Conference Paper

References (7)

1. Lebib A., Chen Y., Cambril E., Youinou P., Studer V., Natali M., Pépin A., Janssen H.M., Sijbesma R.P. Micro. Eng. 61-62:2002;371-377.
2. Schulz H., Wissen M., Roos N., Scheer H.-C., Pfeiffer K., Gruetzner G. SPIE. 4688:2002;223-231.
3. Roos N., Luxbacher T., Glinsner T., Pfeiffer K., Schulz H., Scheer H.-C. SPIE. 4343:2001;427-435.
4. Chen Y., Lebib A., Li S.P., Natali M., Peyrade D., Cambril E. Micro. Eng. 57-58:2001;405-578.
5. Schulz H., Scheer H.-C., Hoffmann T., Sotomayor Torres C.M. J. Vac. Sci. Technol. B. 16:1998;3917-3921.
6. Jaszewski R.W., Schift H., Gobrecht J., Smith P. Micro. Eng. 41-42:1998;575-578.
7. H. Schift, L. Heyderman, to be published.