Novel linear and crosslinking polymers for nanoimprinting with high etch resistance

Microelectronic Engineering

Volumn 53, Issue 1, 2000, Pages 411-414

  Pfeiffer, K ^a   Fink, M ^a   Bleidiessel, G ^a   Gruetzner, G ^a   Schulz, H ^b   Scheer, H C ^b   Hoffmann, T ^b   Sotomayor Torres, C M ^b   Gaboriau, F ^c   Cardinaud, C ^c  

^a MICRO RESIST TECHNOLOGY GMBH   (Germany)

^b UNIVERSITY OF WUPPERTAL   (Germany)

^c UNIVERSITÉ DE NANTES   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ACRYLICS; AROMATIC POLYMERS; CROSSLINKING; DRY ETCHING; HIGH TEMPERATURE TESTING; MICROELECTRONIC PROCESSING; MOLECULAR WEIGHT DISTRIBUTION; POLYMERIZATION; THERMODYNAMIC PROPERTIES;

ALLYL PREPOLYMER; HIGH ETCH RESISTANCE; MULTIFUNCTIONAL ALLYLESTERS; NANOIMPRINTING;

THERMOSETS;

EID: 0034205522     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(00)00345-2     Document Type: Article

References (7)

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