Tri-layer systems for nanoimprint lithography with an improved process latitude

Microelectronic Engineering

Volumn 53, Issue 1, 2000, Pages 175-178

  Lebib, A ^a   Chen, Y ^a   Carcenac, F ^a   Cambril, E ^a   Manin, L ^a   Couraud, L ^a   Launois, H ^a  

^a CNRS   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRODEPOSITION; ELECTRON BEAM LITHOGRAPHY; MULTILAYERS; POLYMETHYL METHACRYLATES; REACTIVE ION ETCHING; SEMICONDUCTING GERMANIUM; SEMICONDUCTING SILICON; SILICA; THERMODYNAMIC STABILITY; TUNGSTEN;

HOT EMPOSSING; NANOIMPRINT LITHOGRAPHY; TRILAYER SYSTEMS;

NANOTECHNOLOGY;

EID: 0034207339     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(00)00290-2     Document Type: Article

References (6)

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