Step & flash imprint lithography

Materials Today

Volumn 8, Issue 2, 2005, Pages 34-42

  Resnick, Douglas J ^a   Sreenivasan, S V ^b   Willson, C Grant ^c  

^a MOTOROLA INC   (United States)

^b MOLECULAR IMPRINTS INC   (United States)

^c The University of Texas at Austin   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ACOUSTIC SURFACE WAVE FILTERS; COST EFFECTIVENESS; ELECTRON BEAMS; GLASS; NANOTECHNOLOGY; PATTERN MATCHING; PHOTOPOLYMERIZATION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PRINTING; PROJECTION SYSTEMS; SUBSTRATES; ULTRAVIOLET RADIATION;

DISTORTION ERRORS; MASKLESS LITHOGRAPHY; NANOMOLDING; NEXT GENERATION LITHOGRAPHY (NGL); NUMERICAL APERTURES;

PHOTOLITHOGRAPHY;

COST EFFECTIVENESS; LITHOGRAPHY; PRINTING; PROJECTION;

EID: 12444274893     PISSN: 13697021     EISSN: None     Source Type: Journal    
DOI: 10.1016/S1369-7021(05)00700-5     Document Type: Article

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