Ultrafast and direct imprint of nanostructures in silicon

Nature

Volumn 417, Issue 6891, 2002, Pages 835-837

  Chou, Stephen Y ^a   Keimel, Chris ^a   Gu, Jian ^a  

^a Princeton University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ETCHING; FABRICATION; LITHOGRAPHY; MICROMETERS; NANOSTRUCTURED MATERIALS; VISCOSITY;

PATTERNING SUBSTRATES;

SILICON;

NANOPARTICLE; SILICONE;

SILICON;

ARTICLE; ATOMIC FORCE MICROSCOPY; EXCIMER LASER; HELIUM NEON LASER; PATTERN GENERATOR; PRIORITY JOURNAL; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR; STRUCTURE ANALYSIS; VISCOSITY;

EID: 0037142072     PISSN: 00280836     EISSN: None     Source Type: Journal    
DOI: 10.1038/nature00792     Document Type: Article

References (11)

1. Pushing the limits of lithography
2. Emerging methods for micro- and nanofabrication
3. Imprint lithography with 25-nanometer resolution
4. Lithographically induced self-assembly of periodic polymer micropillar arrays
5. Ab initio molecular dynamics simulation of laser melting of silicon
6. Liquid phase reflectivity under conditions of laser induced melting
7. In-situ doping of silicon using gas immersion laser doping (GILD)
8. Thin-base bipolar transistor fabrication using gas immersion laser doping
9. Measurement of the density and the thermal expansion coefficient of molten silicon using electromagnetic levitation