|
|
Volumn 61-62, Issue , 2002, Pages 385-392
|
|
Electron beam photoresists for nanoimprint lithography
|
|
Author keywords
CD control; Glass transition; Lithography; Nanoimprint; Polymer
|
|
Indexed keywords
ETCHING;
GLASS TRANSITION;
NANOSTRUCTURED MATERIALS;
NANOTECHNOLOGY;
PHOTORESISTS;
POLYMERS;
THERMODYNAMIC PROPERTIES;
NANOIMPRINT LITHOGRAPHY;
ELECTRON BEAM LITHOGRAPHY;
|
|
EID: 0036643575
PISSN: 01679317
EISSN: None
Source Type: Journal
DOI: 10.1016/S0167-9317(02)00429-X Document Type: Conference Paper |
|
Times cited : (22)
|
|
References (10)
|
